2results about How to "Increase air flow rate" patented technology

This utility model relates to the field of bladeless fan technology, specifically disclosing a centrifugal fan and a bladeless fan, including a volute with an air inlet and an air outlet. An impeller is installed inside the volute, and the impeller is connected to a drive component for driving the impeller to rotate. A semi-enclosed volute tongue structure is provided inside the volute near the air outlet, and a sound-absorbing chamber is formed within the volute tongue structure. A sound-absorbing component is installed in the sound-absorbing chamber. Multiple through holes are formed on the wall of the volute tongue structure near the impeller to make the volute tongue structure semi-enclosed. This allows the aerodynamic noise generated by the airflow and the mechanical noise generated by the impeller rotation to be efficiently concentrated and drawn into the sound-absorbing component through the through holes when the centrifugal fan of the bladeless fan is working, thereby improving the sound absorption and noise reduction effect and improving the user's sleep quality or user experience.

The application relates to the field of semiconductor manufacturing, and discloses a wafer rotating wet treatment device which comprises fixing mechanisms arranged in four groups and distributed at equal intervals along the axis of a rotating cylinder, wherein the fixing mechanisms comprise communicating columns, the outer surfaces of the communicating columns are fixedly connected with support plates and limiting cylinders respectively, the outer surfaces of the limiting cylinders are sleeved with buffer cylinders, and the outer surfaces of the buffer cylinders are fixedly connected with containing cylinders through connecting columns. Negative pressure is generated in the inner cavities of the communicating tubes, the negative pressure is finally applied to the lower surface of a wafer at the top of a suction disc under the communicating action of communicating cavities, communicating columns and hoses, so that suction force for fixing the wafer is generated, the suction force can maintain the wafer in a state of relative static with the fixing mechanism as a whole at the lowest value when the wafer rotates, the design greatly simplifies the structure of the device, and the negative pressure adsorption and fixing function of the wafer is also achieved, and the fixing effect is good.