The invention discloses continuous self-cleaning glass substrate growth equipment which comprises a feeding and receiving transition cabin mechanism, an air cylinder pushing mechanism, a quartz tube,a first heating furnace, a second heating furnace and an equipment frame. The quartz tube is cylindrical and is fixedly arranged on the equipment frame; the feeding and receiving transition cabin mechanism comprises a discharging cabin, a receiving cabin and a quartz tube; the bottoms of the two ends of the quartz tube are fixedly connected with the equipment frame through supporting frames. The wall portion of one end of the quartz tube is communicated with a discharging bin through a flange, a first gate valve is arranged at the joint of the flange, a first air cylinder is arranged at the end of the discharging bin, and the first air cylinder is connected with a first push rod extending into a cavity of the discharging bin. The equipment is an innovative invention developed on the basisof a carbon dioxide etching method, has the characteristics of simplicity, mildness, low cost and releasability through the carbon dioxide etching method, and is very suitable for large-area and low-cost batch preparation of the ultra-clean graphene film.