Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

40results about How to "Simple integration process" patented technology

Double-sided efficient heat dissipation airtight packaging structure and preparation method thereof

The invention relates to the technical field of microelectronic heat dissipation, and discloses a double-sided efficient heat dissipation airtight packaging structure and a preparation method thereof. The packaging structure comprises a heat dissipation micro-channel, a packaging substrate, a first chip, a second chip, an enclosure frame, cover plates, a liquid cooling connector and an electric connector; the heat dissipation micro-channel and the enclosure frame are welded on the packaging substrate; the first chip is welded on the heat dissipation micro-channel, the second chip is welded on the packaging substrate, and the first chip and the second chip are interconnected with the packaging substrate; the cover plates are respectively welded on the enclosure frame and the packaging substrate; and the liquid cooling connector and the electric connector are welded at the bottom of the packaging substrate. According to the invention, efficient heat dissipation of the high-power chip and effective heat dissipation of the medium-and-small-power chip can be realized, so that heat in the packaging structure is uniformly distributed.
Owner:SOUTHWEST CHINA RES INST OF ELECTRONICS EQUIP

Display pronunciation integrated device and manufacturing method thereof

The invention provides a display pronunciation integrated device and a manufacturing method thereof, relates to the technical field of display and pronunciation integration, and aims at solving the problems that in the prior art, when a display device and a pronunciation device are integrated, the integration process is complex, and the pronunciation mode, quality and the like are limited. The manufacturing method comprises the steps: manufacturing the display pronunciation integrated device, manufacturing a driving back plate, forming a plurality of light-emitting elements on the driving backplate, distributing the plurality of light-emitting elements on the driving back plate in an array manner, forming gaps between the adjacent light-emitting elements, electrically connecting the plurality of light-emitting elements with the pixel driving circuits in a one-to-one correspondence manner, and enabling the light-emitting elements to emit light under the driving of the corresponding pixel driving circuits; and transferring a plurality of pronunciation devices into the gaps, so that the plurality of pronunciation devices are electrically connected with the pronunciation driving circuits in a one-to-one correspondence manner, and the pronunciation devices are used for pronunciating under the driving of the corresponding pronunciation driving circuits. The manufacturing method provided by the invention is used for manufacturing the display pronunciation integrated device.
Owner:BOE TECH GRP CO LTD

A method for preparing strained silicon by high-energy X-rays

The invention discloses a method for preparing strained silicon by high energy X ray, and relates to the manufacturing field of an integrated circuit. The method comprises the following steps of (1) synthesizing a Si / SiO<2> dual-layer composite structural system, wherein the upper surface of the structure is covered with a silicon thin film of a silicon dioxide layer; (2) if partial strain needs to occur, placing a shielding layer above the Si / SiO<2> dual-layer composite structural system, and forming a groove hole with the corresponding dimension and shape in the shielding layer above the required strain region of the silicon thin film; and if global strain needs to occur, not placing the shielding layer; and (3) performing illumination on the Si / SiO<2> dual-layer composite structural system by high energy X ray through the shielding layer to prepare strained silicon. By virtue of the initial application of the method of the high energy X ray, by combination of the method of region-selecting shielding, and by virtue of the characteristic that the X ray beam spot area is larger than the dimension of a silicon wafer, quick preparation of strained silicon is realized; and the methodhas the advantages of low working temperature, controllable strain region, no introduction of impurity, simple process, large scope of variables, high production efficiency, no silicon damage and thelike, and is expected to be widely applied to the fields of a semiconductor integrated circuit, a micro-nano electronic device and the like.
Owner:XI AN JIAOTONG UNIV

Common reference electrode temperature controlled CO2-SOx integrated gas sensor and preparation method thereof

The invention discloses a common reference electrode temperature controlled CO2-SOx integrated gas sensor and a preparation method thereof. The sensor comprises an alumina substrate, a heating element, a temperature measurement element, an insulating layer, a thin layer of solid electrolyte, an Au tooth-shaped film electrode, a CO2 reaction electrode, a SOx reaction electrode and a common reference electrode from the bottom up. The preparation method comprises the following steps: preparing a Pt or RuO2 heating and temperature measurement element on an Al2O3 substrate by a printing and sintering process; carrying out deposition process on a thick film micro-heating element to obtain the thin layer of solid electrolyte, an Au tooth-shaped electrode, the CO2 reaction electrode, the SOx reaction electrode and the common reference electrode, and forming a CO2-SOx gas-sensitive element combined with thin and thick-film technique by electrochemical reaction mode. According to the invention, a closed loop temperature-control system is formed by the feedback of the temperature measurement element, thus the temperature of the sensor reaches the temperature required by the work of each reaction electrode and keeps constant, and the optimum work performance of the CO2-SOx gas sensor is guaranteed.
Owner:SHENZHEN TIANDITONG ELECTRONICS CO LTD

Integrated electro-optical modulator

PendingCN111240055ALow direct couplingLow Loss Direct CoupledOptical light guidesNon-linear opticsCoupling lossGrating
The invention discloses an integrated electro-optical modulator, comprising a SiO2 layer and a Si layer which are arranged in a stacked mode. A first silicon waveguide phase shift arm and a second silicon waveguide phase shift arm are arranged on the Si layer, and a PLC waveguide shunt and a combiner are arranged in the SiO2 layer. Two branches of the PLC waveguide splitter are respectively communicated with the first silicon waveguide phase shift arm light path and the second silicon waveguide phase shift arm light path based on evanescent wave coupling, and two branches of the PLC waveguidecombiner are respectively communicated with the first silicon waveguide phase shift arm light path and the second silicon waveguide phase shift arm light path based on evanescent wave coupling. The invention discloses an integrated electro-optical modulator. The PLC waveguide splitter / combiner is matched with the silicon waveguide phase shift arm to realize electro-optical modulation, so that high-speed electro-optical modulation is realized by utilizing the silicon waveguide phase shift arm, and low-loss direct coupling of the modulator and the optical fiber is realized by utilizing the characteristic that the PLC waveguide device is matched with a single-mode optical fiber mode field. The problems that according to traditional silicon-based electro-optical modulation, due to the fact that mismatch between a silicon waveguide and a single-mode optical fiber mode field is large, a mode spot converter or a vertical coupling grating of a complex structure needs to be arranged to achieveoptical fiber coupling, and coupling loss is large are solved.
Owner:HENGTONG ROCKLEY TECHNOLOGY CO LTD

A scanning high-energy micro-beam x-ray method for preparing strained silicon

The invention discloses a method for preparing strained silicon by a scanning-type high-energy microbeam X-ray, and relates to the field of the integrated circuit manufacture. The method comprises thefollowing steps: synthesizing a Si / SiO2 double-layer composite structure system, wherein the structure thereof is a silicon film of which the upper surface is covered by a silicon dioxide layer, successively illuminating areas expected to produce strain in the Si / SiO2 double-layer composite structure system by using the high-energy microbeam X-ray according to a certain sequence, to prepare the strained silicon of the local strain. The method is capable of firstly using a high-energy microbeam X-ray method, using a feature that the area of a beam spot of the microbeam X-ray is tiny, thereby achieving the purposes of accurately selecting and controlling the strain areas of the strained silicon, and producing the size-controllable strain capacity in the different strain areas. The method has the advantages of controllable strain areas and size precision, low working temperature, no introduced impurities, simple process, large strain capacity range, no damage to silicon and the like, andis expected to be extensively applied in the fields, such as semiconductor integrated circuits and micro-nano electronic devices.
Owner:XI AN JIAOTONG UNIV

Display and pronunciation integrated device and its manufacturing method

The present invention provides a display and pronunciation integration device and a manufacturing method thereof, and relates to the technical field of display and pronunciation integration. In order to solve the problem of complex integration process and limitations in the way and quality of pronunciation when the display device and the pronunciation device are integrated in the prior art The problem. The manufacturing method of the display and pronunciation integrated device includes: making a driving backplane, forming a plurality of light-emitting elements on the driving backplane, the plurality of light-emitting elements are distributed on the driving backplane in an array, and there are gaps between adjacent light-emitting elements. Each light-emitting element is electrically connected to the pixel driving circuit in one-to-one correspondence, and the light-emitting element is used to emit light under the drive of the corresponding pixel driving circuit; a plurality of sound-emitting devices are transferred in the gap, so that the plurality of sound-emitting devices are in one-to-one correspondence with the sound-emitting driving circuit Electrically connected, the sounding device is used for sounding under the drive of the corresponding sounding driving circuit. The manufacturing method provided by the invention is used for manufacturing a display and pronunciation integrated device.
Owner:BOE TECH GRP CO LTD

Silicon-based double-sided vertical cavity surface emitting laser and preparation method thereof

The invention provides a silicon-based double-sided vertical cavity surface emitting laser and a preparation method thereof. The silicon-based double-sided vertical cavity surface emitting laser comprises the following structures: a p-type monocrystalline silicon substrate subjected to double-sided polishing; a first p-type buffer layer on a surface in contact with the polished upper surface; a second p-type buffer layer on a surface in contact with the polished lower surface, wherein the material of the first p-type buffer layer is different from the material of the second p-type buffer layer; a short-wave laser emission module, wherein a quantum dot structure of the short-wave laser emission module is a non-doped GaNP / InP / GaNP; wherein the quantum dot structure of the long-wave laser emission module is non-doped GaNAs / InAs / GaNAs. According to the silicon-based double-sided vertical cavity surface emitting laser, a short wave and long wave coexisting VCSEL device can be prepared based on the monocrystalline silicon substrate, and the silicon-based double-sided vertical cavity surface emitting laser can be conveniently applied to communication systems, sensing systems, intelligent control systems and the like which are high in function integration level.
Owner:深圳市中科光芯半导体科技有限公司

Touch substrate and preparation method thereof, touch module, touch display screen and electronic equipment

The invention discloses a touch substrate, a preparation method thereof, a touch module, a touch display screen and electronic equipment. The touch substrate comprises: a substrate, wherein a first touch pattern layer and a first lead group electrically connected with the first touch pattern layer are arranged on a first surface of the substrate; and an antenna coil which is arranged on the firstsurface, wherein the antenna coil comprises a coil part and a contact part, the coil part is arranged around the first touch pattern, the contact part comprises a first contact arranged in the coil part and a second contact arranged outside the coil part, and the first contact and the second contact are used for being electrically connected to an external chip; the substrate is further provided with a first through hole penetrating through the substrate, an electric conductor is arranged in the first through hole, the end, close to the first surface, of the electric conductor is electrically connected with the first contact, and the other end of the electric conductor extends to the second surface opposite to the first surface and forms a third contact on the second surface. According to the touch substrate, the integration process of the NFC antenna is simplified, and the risk that a traditional NFC antenna is artificially damaged is eliminated.
Owner:盈天实业(深圳)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products