A photosensitive compound whose size is smaller than conventional
polymer for
photoresist, and which has well-defined (uniform) structure, and a
photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a
photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an
organic solvent.In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently
hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a
hydrogen atom or
hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.