This invention relates to an amorphous thin film, its preparation method, and its application. The amorphous thin film is an
AlSiC amorphous thin film, composed of Al, Si, and C. The preparation method includes the following steps: providing a target material, and depositing the amorphous thin film on a substrate using magnetron
sputtering. The amorphous thin film can be used as a surface protection material. This invention utilizes the disordered arrangement of Al, Si, and C atoms to form the
AlSiC amorphous thin film, resulting in a film that combines high strength, high
hardness, and high
toughness, achieving a strong and tough integrated structure. Consequently, when used as a surface protection material, the
AlSiC amorphous thin film of this invention provides excellent protection and a longer service life. Furthermore, the magnetron
sputtering method used in this invention for preparing the AlSiC amorphous thin film results in a stable
deposition rate, and the deposited AlSiC amorphous thin film exhibits uniform composition, dense structure, few defects, good adhesion to the substrate, and strong bonding.