The present invention discloses a method for preparing a
nickel oxide thin film, its product and application, belonging to the technical field of photovoltaic materials and devices. The preparation method of the present invention includes: providing a homogeneous
aqueous solution containing a
nickel source compound and a basic
amino acid, and chemically bath-depositing the homogeneous
aqueous solution on the surface to be coated of a substrate, so that a
nickel hydroxide film layer is formed in-situ on the surface to be coated, and then annealing the nickel
hydroxide film layer to generate a
nickel oxide thin film. By introducing a basic
amino acid into the nickel source chemical bath
aqueous solution for
chemical bath deposition, the present invention can not only effectively and reasonably adjust the
nucleation rate of nickel
hydroxide by forming multi-dentate coordination with moderate strength between the basic
amino acid and
nickel ions, but also prevent the aggregation of nanoparticles through steric hindrance effect, effectively improving the dispersion effect of nanoparticles. Thus, the deposition behavior of nickel hydroxide nanoparticles is synergistically optimized in two aspects, and finally the controllable preparation of a
nickel oxide thin film with uniform density and good
crystallinity is achieved.