The invention provides an
electroplating device which comprises an
electroplating cavity used for containing
electroplating liquid; the
anode is positioned in the electroplating cavity; the substrate holding device is used for clamping the substrate and immersing the plating surface of the substrate into the electroplating liquid during electroplating; the substrate extension
assembly comprises an extension cavity, an extension
cathode and a diaphragm, the extension
cathode is located in the extension cavity and is biased by the
cathode, and the diaphragm is used for isolating the extension cathode from the electroplating cavity; wherein the extension cavity is provided with a drainage part facing the
anode, the drainage part is provided with an opening, and during electroplating, the drainage part is located below the substrate, surrounds the radial outer side of the substrate, is parallel to the plating surface of the substrate and is used for enabling current from the
anode to partially flow to the extension cathode through the drainage part; and the drainage part forms an extending plating surface on the radial outer side of the substrate. According to the electroplating device, the negative influence of the edge effect on the substrate is effectively inhibited or even eliminated.