112 results about "Optical Processes" patented technology

A method for performing a matrix-based verification technique such as optical process correction (OPC) that analyzes interactions between movement of a fragment on a mask and one or more edges to be created on a wafer. In one embodiment, each edge to be created is analyzed and one or more fragments of a mask are moved in accordance with a gradient matrix that defines how changes in position of a fragment affect one or more edges on the mask. Fragments are moved having a significant effect on an edge in question. Simulations are performed and fragments are moved in an iterative fashion until each edge has a objective within a prescribed tolerance. In another embodiment, each edge has two or more objectives to be optimized. A objective is selected in accordance with a cost function and fragments are moved in a mask layout until each edge has acceptable specification for each objective.

There is provided a non-linear optical device for enhancing the bandwidth accessible in the nonlinear generation of an optical signal. The device comprises a planar optical waveguide, the planar optical waveguide being operative to generate an optical output from an optical input having an input bandwidth by means of a non-linear optical process, the optical output having a wavelength within an accessible bandwidth, wherein the planar optical waveguide is operative to enhance the accessible bandwidth such that the ratio of the accessible bandwidth to the input bandwidth is at least 4. The device is particularly applicable to broad optical continuum generation, but may also be used in a parametric oscillator or amplifier arrangement with broad tuning range.

An integrated verification and manufacturability tool provides more efficient verification of integrated device designs than verification using several different verification tools. The integrated verification and manufacturability includes a hierarchical database to store shared design data accessed by multiple verification tool components (e.g., layout versus schematic, design rule check, optical process correction, phase shift mask assignment and machine language conversion). The hierarchical database includes representations of one or more additional, or intermediate layer structures that are created and used by the verification tool components for operations performed on the design being verified. Use of a single hierarchical database having shared data for access and use by multiple verification components streamlines the verification process, which provides an improved verification tool.

The invention relates to a method and device of disposing high-quality holes on carbon fiber composite material and meal material which are overlapped, belonging to the field of the mechanical processing and manufacturing technology. The method of disposing high-quality holes on the carbon fiber composite material and the meal material which are overlapped is characterized in that in the process of disposing holes on the carbon fiber composite material and the meal material which are overlapped by a device of disposing holes, such as a polycrystalline diamond (PCD), a coating, a cemented carbide bit and a diamond grinding rod, the rotating speed and the feeding speed of a cutter are automatically changed according to the materials on which holes are to be disposed by the hardware triggering or software numerical-control programming control mode of a feeding position sensor set so that the cutter can be in the optical process parameter state. The device of disposing high-quality holes on the carbon fiber composite material and the meal material which are overlapped is characterized by comprising a body, the cutter the handle of the cutter, an electric main shaft, the feeding position sensor set, a vertical feeding sliding-platform, a main shaft variable-frequency speed-regulating system and a hole disposing device numerical control system. The invention realizes the adaptive continuous processing, obviously improves the quality and the processing efficiency of holes disposed integrally on different overlapped materials and lowers the production cost.

An integrated verification and manufacturability tool provides more efficient verification of integrated device designs than verification using several different verification components. The integrated verification and manufacturability includes a hierarchical database to store shared design data accessed by multiple verification components (e.g., layout versus schematic, design rule check, optical process correction, phase shift mask assignment and OPC verification and machine language conversion). The hierarchical database includes representations of one or more additional, or intermediate layer structures that are created and used by the verification components for operations performed on the design being verified. Use of a single hierarchical database having shared data for access and use by multiple verification components streamlines the verification process, which provides an improved verification tool.

This invention discloses a test method for wafers including: utilizing an optical process unit in an AVI tool to get an optical image of a wafer, carrying out grey computation to the image and dividing it to several zones, selecting a subarea standard chip, finally, carrying out contrast of grey values to other chips in different areas with the standard one to test defect chips, in which, the mode of partition is decided according to the state of products, a subarea can be any area in the image and the standard chip may be one existing in the chip or a virtual chip model got by the AVI tool, and a judgment standard should be designed in advance before contrasting grey values.

A plasmonic grating sensor having periodic arrays of vertically aligned plasmonic nanopillars, nanowires, or both with an interparticle pitch ranging from λ/8−2λ, where λ is the incident wavelength of light divided by the effective index of refraction of the sample; a coupled-plasmonic array sensor having vertically aligned periodic arrays of plasmonically coupled nanopillars, nanowires, or both with interparticle gaps sufficient to induce overlap between the plasmonic evanescent fields from neighboring nanoparticles, typically requiring edge-to-edge separations of less than 20 nm; and a plasmo-photonic array sensor having a double-resonant, periodic array of vertically aligned subarrays of 1 to 25 plasmonically coupled nanopillars, nanowires, or both where the subarrays are periodically spaced at a pitch on the order of a wavelength of light.

An achromatic 3D STED measuring optical process and optical method, based on a conical diffraction effect or an effect of propagation of light in uniaxial crystals, including a cascade of at least two uniaxial or conical diffraction crystals creating, from a laser source, all of the light propagating along substantially the same optical path, from the output of an optical bank to the objective of a microscope. A spatial position of at least one luminous nano-emitter, structured object or a continuous distribution in a sample is determined.

Reconstruction of the sample and its spatial and/or temporal and/or spectral properties is treated as an inverse Bayesian problem leading to the definition of an a posteriori distribution, and a posteriori relationship combining, by virtue of the Bayes law, the probabilistic formulation of a noise model, and possible priors on a distribution of light created in the sample by projection.

A computer system reads data corresponding to an IC layout target layer and performs an etch simulation on the target layer. Etch biases are calculated and the inverse of the etch biases are used to produce a new target layer. The new target layer is provided as an input to an optical process correction (OPC) loop that corrects the data for image/resist distortions until a simulation indicates that a pattern of objects created on a wafer matches the new target layer. In another embodiment of the invention, original IC layout data is provided to both the OPC loop and an etch simulation. Etch biases calculated by the etch simulation are used in the OPC loop in order to produce mask/reticle data that will be compensated for both optical and resist distortions as well as for etch distortions.

In an apparatus for recording a broadcast program on an optical disk, a broadcast reception section receives a broadcast signal containing various programs broadcasted from a broadcast station. A recording setup section specifies a program to be recorded on an optical disk among the various programs contained in the received broadcast signal. An information acquisition section acquires attribute information associative of content of the specified program from an electronic program guide of various programs. A recording/reproducing section is operated to record the content of the specified program by forming a pattern of marks and spaces on a data recording face of the optical disk with an optical process of irradiating an optical beam onto the data recording face, and is also operated to form a visible image of the attribute information of the recorded content with the optical process on other area of the data recording face than the area where the content is recorded or on a label face reverse to the data recording face of the optical disk.

The invention provides a method and a device for optics based quantum random number generation. A method and device for generating random numbers based on an optical process of quantum nature. According to one exemplary aspect, the method includes randomly emitting photons from a light source and absorbing the emitted photons by a photon sensor having a plurality of pixels. Furthermore, respective minimum entropy levels can be calculated for each of the pixels of the photon sensor and a randomness extractor can be associated with each of pixels based on the calculated minimum entropy level of that pixel. After this calibration, the method and device generates a number of high-entropy bits used for generating a random number.

Image processing utilizing numerical calculation of fractional exponential powers of a diagonalizable numerical transform operator for use in an iterative or other larger computational environments. In one implementation, a computation involving a similarity transformation is partitioned so that one part remains fixed and may be reused in subsequent iterations. The numerical transform operator may be a discrete Fourier transform operator, discrete fractional Fourier transform operator, centered discrete fractional Fourier transform operator, and other operators, modeling propagation through physical media. Such iterative environments for these types of numerical calculations are useful in correcting the focus of misfocused images which may originate from optical processes involving light (for example, with a lens or lens system) or from particle beams (for example, in electron microscopy or ion lithography).

The invention provides a photolithographic process optimization method which comprises the following steps: selecting feature data; selecting a parameter to be optimized from the feature data to generate a corresponding OPC model; under different focusing conditions, under different energy conditions and under a circumstance that the focusing conditions and the energy conditions are constant, adopting the OPC model to conduct simulation on the selected feature data respectively to obtain the simulated values of the selected feature data under various optical process parameter conditions respectively, calculating the focal depth, the energy tolerance and the mask pattern error enhancement factor of a process window adopting the selected parameter to be optimized according to the simulated values respectively, and analyzing whether the focal depth, the energy tolerance and the mask pattern error enhancement factor meet the design requirements of the process window or not; determining the optimal simulated value of the parameter to be optimized; repeating the processes to conduct simulation on other parameters to be optimized, and determining the corresponding optimal simulated value.

An optical processing unit comprises a dichroic filter to filtrate a green-colored light off a white light, a polarizer to selects a certain linearly polarized light component from the filtrated green-color light and a dichroic mirror to resolve the light into two lights as the first light beam and the second light beam divided at a predetermined wave length, two beam splitters to change the propagation direction of the light beams, liquid crystal devices to reflect the light beams thereon, reflective image superimposing devices to superimpose image information in the reflection onto two image lights and a dichroic mirror to compose these two image lights into an identically single image light which directs toward a direction in a single optical axis. This invention can provide an optical process unit that realizes a high fidelity stereo image display system wherein the pixel-shifted image generation and the stereo image display are compatible.

The invention discloses a resonant optical gyroscope simulation method, comprising steps of 1) initializing a global time signal required by simulation; 2) providing the global time signal in the step 1) to various data signals on a computer simulation platform; 3) setting parameters involved in data signal process in the simulation task; 4) setting a simulation time length of simulation system; 5) starting system simulation to process signals; 6) observing and storing simulation results; 7) analyzing simulation result in the step 6) 8) changing simulation parameters for continuous simulation or simulation realized. The invention uniforms optical process and electrooptical process in resonant optical gyroscope by packaging optical and electric apparatus as modules, which greatly reduces work load of constructing system during simulation and overcomes problem that traditional method can not reproduce various optical phenomena. The optical noise is described by compute language and influence of optical noise in simulation is added, which enhances process of optical noise.

The invention relates to a circulating cooling system for an optical processing center. The system consists of a water tank, an inlet pump, an inlet pipe, a return pipe and a filtrating and settling device, wherein the water inlet of the inlet pump is communicated with the water tank and the water outlet of the inlet pump is communicated with the optical processing center by the inlet pipe; the coolant of the inlet pump from the water tank is released to the processing center through the inlet pipe, and the glass powder particles produced in the processing course flows into the filtrating and settling device accompanying by the coolant; the outlet of the filtrating and settling device is communicated with the water tank, and the coolant flows into the water tank after the complete filtration and settlement in the filtrating and settling device. The invention enables the full filtration of glass powder particles in the course of optical processing, thus ensuring the processing quality of optical elements.

A LED lamp and a light effect improving method thereof. A bulb shell (2) is covered on LED beads (3), and is mounted in a reflection cup (1). The bulb shell (2) is used for processing a primary optical process for the light emitted by the LED beads (3). The reflection cup (1) is used for processing a secondary optical process for the light which is subjected to the primary optical process performed by the bulb shell (2). By the functions such as refraction, scattering, diffusion and the like of the bulb shell (2), the primary emergent light emitted from the LED beads (3) is subject to the primary optical process such as mixing, scattering and so on, so as to realize the treatment effect that the light is emitted from the three-dimensional surface of the bulb shell (2). The reflection cup (1) performs the secondary optical process, so as to reflect the scattering light within a certain angle range.