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44results about How to "High OD value" patented technology

Kit of Mycobacterium tuberculosis and detection method thereof

The invention discloses a kit of Mycobacterium tuberculosis and a detection method thereof. The kit contains an enzyme-linked immunosorbent assay (ELISA) plate, a biotin-labeled single-stranded DNA adaptor, horseradish peroxidase-labeled streptavidin and a chromogenic substrate. In the detection method provided by the invention, the biotin-labeled single-stranded DNA adaptor of Mycobacterium tuberculosis H37Rv is used as a probe and a method which is similar to the indirect enzyme-linked immunosorbent assay (ELISA) method is adopted to detect Mycobacterium tuberculosis; and Mycobacterium tuberculosis or sputum to be detected or a body fluid sample, and a control sample are added in the ELISA plate for incubation, Mycobacterium tuberculosis combined with the plate is trapped by the biotin-labeled single-stranded DNA adaptor and then washed, the horseradish peroxidase-labeled streptavidin is added, the substrate is added for developing, and the optical density (OD) value is detected by a microplate reader after developing when the absorption wavelengh is 450nm. When the kit provided by the invention detects Mycobacterium tuberculosis or the Mycobacterium tuberculosis or somatic antigen in sputum, blood and body fluid, the detection speed is high, the detection is convenient and safe, the detection time can be saved, the efficiency is high, the cost is low, the detection sensitivity and accuracy are high, and the application prospect is wide.
Owner:WUHAN UNIV

High-temperature-resistant black exposure and development printing ink, method for preparing same and application

The invention provides high-temperature-resistant black exposure and development printing ink, a method for preparing the same and application. The high-temperature-resistant black exposure and development printing ink is applied to the field of decoration of different types of 3D (three-dimensional) curved glass and special-shaped glass. The high-temperature-resistant black exposure and development printing ink is double-component printing ink. A component A of the high-temperature-resistant black exposure and development printing ink comprises epoxy resin, polyester resin, fillers, carbon black, auxiliaries, photoinitiators and cyclohexanone. A component B of the high-temperature-resistant black exposure and development printing ink comprises closed curing agents and butyl acetate. Diluents comprise butanone, butyl acetate and MIBK (methyl isobutyl ketone). The high-temperature-resistant black exposure and development printing ink, the method and the application have the advantages that the curing agents and the diluents can be proportionally added, then the high-temperature-resistant black exposure and development printing ink can be sprayed, 1% sodium carbonate solution can besprayed for 30-90 seconds after the high-temperature-resistant black exposure and development printing ink is preliminarily baked and exposed, unexposed regions can be quickly faded, clear images canbe displayed, and the high-temperature-resistant black exposure and development printing ink is free of residues; the high-temperature-resistant black exposure and development printing ink can be ultimately baked at the temperatures of 150-180 DEG C for 30 minutes, the dried high-temperature-resistant black exposure and development printing ink is excellent in insulating property and good in adhesion, has a high OD (optical density) value and can resist high temperatures, and the problems of low yield and efficiency and high cost of the traditional decoration technologies for 3D curved glass and special-shaped glass can be effectively solved.
Owner:江西赐彩新材料股份有限公司

Composite white pigment, photoresist material containing same and application of composite white pigment

The invention relates to the field of liquid crystal display, in particular to a composite white pigment and a photoresist material. The composite white pigment comprises an inner core prepared from a non-white pigment, and an outer layer prepared from a white pigment, wherein the photoresist material provided by the invention is prepared from the following components in parts by weight: 5-15 parts of a photosensitizer, 5-15 parts of a dispersing agent, 50-80 parts of a solvent and 5-15 parts of a composite white pigment. Through a double-layer structure design with different colors in inner layer and outer layer, the defects of the original ordinary pure white pigment on a light absorption surface are improved with the nonwhite inner core; improvement of the light absorption properties of the traditional white photoresist material is facilitated; the absorption rate of the white color on the light can be increased; the screening capacity of the photoresist is improved; the color can be relatively uniform; the material can be ideally applied to a one-glass-solution (OGS) frame material; a few of manufacture procedures of a white lithography process can be reduced; and the OD value can be effectively increased.
Owner:HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD +1
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