50results about How to "Addressing Insufficient Selectivity" patented technology

A spectrometer assembly is provided having an optical transmission filter including a stack of continuous, non-patterned alternating dielectric and metal layers. Angle-dependent transmission wavelength shift of the optical transmission filter with continuous metal layers is small e.g. in comparison with multilayer dielectric filters, facilitating size reduction of the spectrometer assembly.

The present invention discloses polymer functionalized molecular sieve/polymer mixed matrix membranes (MMMs) with either no macrovoids or voids of less than several Angstroms at the interface of the polymer matrix and the molecular sieves by incorporating polymer functionalized molecular sieves into a continuous polymer matrix. The MMMs exhibit significantly enhanced selectivity and/or permeability over the polymer membranes made from the corresponding continuous polymer matrices for separations. The MMMs are suitable for a variety of liquid, gas, and vapor separations such as deep desulfurization of gasoline and diesel fuels, ethanol/water separations, pervaporation dehydration of aqueous/organic mixtures, CO₂/CH₄, CO₂/N₂, H₂/CH₄, O₂/N₂, olefin/paraffin, iso/normal paraffins separations, and other light gas mixture separations.

A circuit and method is disclosed for measuring the resistance of a resistive sensor, such as a PTC or NTC temperature sensor used for monitoring the temperature of the windings of an electric motor. The measurement circuit is based on an electronic circuit in which conductors from a sensor located in the object to be monitored are connected to an amplifier circuit in a feedback configuration that reduces the DC level supplied to the voltage divider when the sensor resistance increases. The measured signal is amplified and, using a comparator to compare it with the output voltage of a sawtooth generator, a continuous PWM (Pulse Width Modulation) signal is generated and transmitted in digital format to a SELV electronic circuit, for example through an opto-isolator. The essentially logarithmic signal amplification makes it possible to reliably distinguish between a short circuit in the sensor circuit and low values of sensor resistance.

In a plasma etching method, a substrate, on which an oxide film as a target layer to be etched, a hard mask layer, and a patterned photoresist are sequentially formed, is loaded into the processing chamber and mounted on a lower electrode. A processing gas containing C_xF_y (x is 3 or less and y is 8 or less), C₄F₈, a rare gas and O₂ is supplied and a plasma of the processing gas is generated by applying a high frequency power to an upper or a lower electrode. Further, a high frequency power for bias is applied to the lower electrode, and a DC voltage is applied to the upper electrode.

To provide a slurry for Chemical Mechanical Polishing, a Chemical Mechanical Polishing method using said slurry, and a method of producing electronic devices using said method that makes it possible to achieve a low scratch process capability in processing surfaces such as SiO₂ film surfaces and the like and also to enable speed polishing to attain a high processing efficiency.

Slurry for Chemical Mechanical Polishing characterized in comprising abrasive grains and water, wherein said abrasive grains are composite particles coated with ceria particles consisting of organic host particles and ceria particles, zeta potential of said composite particles being a negative potential, the organic host particles constituting the composite particles coated with ceria particles are organic host particles to which carboxyl groups and sulfonyl groups are introduced; the slurry is added with panarization additive; and the planarization additive is poly(methyl)acrylic acid ammonium salt.

A method for forming bumps is disclosed. First, a substrate having an adhesive, a barrier, and a wetting layer thereon is provided. Next, a patterned photoresist is formed on the wetting layer, in which the patterned photoresist includes at least one opening for exposing a portion of the wetting layer. Next, a solder is deposited in the opening, and a stripping process is performed to remove the patterned photoresist. Next, a first etchant is utilized to perform a first etching process for etching a portion of the wetting and barrier layers by utilizing the solder as a mask, in which the first etchant is selected from the group consisting of: sulfuric acid, phosphoric acid, ferric chloride, ammonium persulfate, and potassium monopersulfate. Next, a second etchant is utilized to perform a second etching process removing a portion of the adhesive layer, and a reflow process is performed to form a bump.

A receiver apparatus includes a band-pass filter having a variable frequency band coupled to a node for receiving a received signal including a plurality of channels to output at an output node thereof a limited-band signal made by limiting a frequency band of the received signal to a frequency band of a desired channel, a frequency conversion unit coupled to the output node of the band-pass filter to output at an output node thereof an intermediate frequency signal made by converting frequencies of the limited-band signal, and a control unit configured to adjust an intermediate frequency of the intermediate frequency signal by controlling the frequency conversion unit in response to at least one of a signal speed and a channel frequency interval of the received signal.

In a plasma etching method for plasma-etching an etching stop film after plasma-etching a low-k film in a structure in which a wiring layer, the etching stop film made of an SiC-based material, the low-k film and an etching mask are formed in that order on a substrate, the method includes the step of arranging the structure having the plasma-etched low-k film in a processing chamber in which a first and a second electrode are provided to face each other at vertically separated locations. The plasma etching method further includes the steps of introducing a processing gas containing NF₃ into the processing chamber; generating a plasma by applying a high frequency power to one of the first and the second electrode; and applying a DC voltage to said one of the electrodes.

The objective of the invention is to provide a high-efficiency separation and purification method for pneumocandin. The high-efficiency separation and purification method is characterized in that a hydrophilic silica-gel material surface-modified by polar groups is adopted; a crude pneumocandin product is dissolved by using a mixture of an organic solvent and an aqueous solution in a certain ratio; after sample loading, a mixture of an organic solvent and water in a certain ratio is used for elution; and purification is carried out so as to obtain pneumocandin B0 with chromatographic purity ofmore than 99%, wherein the content of the critical impurity C0 is less than 0.1%. The method provided by the invention realizes high-efficiency separation and purification of pneumocandin B0, has thecharacteristics of good stability, great sample loading amount, simple operation, controllability, etc., and is applicable to industrial separation and purification.

A mass spectrometer is disclosed comprising an ion mobility spectrometer and an ion gate. A collision cell is arranged downstream of the ion gate. The operation of the ion mobility spectrometer and the ion gate are synchronised so that only ions having a particular mass to charge ratio and a desired charge state are onwardly transmitted to the collision cell.

A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3,

[R¹O]₃Si—X   [Chemical Formula 1]

[R²O]₃Si—R³   [Chemical Formula 2]

[R⁴O]₃Si—Si[OR⁵]₃.   [Chemical Formula 3]

Provided are enzymatic processes for the production of chemicals like ethanol from carbon sources like glucose, in particular, a process for the production of a target chemical is disclosed using a cell-free enzyme system that converts carbohydrate sources to the intermediate pyruvate and subsequently the intermediate pyruvate to the target chemical wherein a minimized number of enzymes and only one cofactor is employed.

The invention relates to a process for preparing hydrogen by reforming hydrocarbons with steam, and for separation of carbon dioxide. The process includes one endothermic and one autothermal reforming step for production of a synthesis gas stream, wherein heat generated in the autothermal reforming step is utilized for heating in the endothermic reforming step. The process also includes a step of converting the synthesis gas stream obtained for enrichment with hydrogen, a step of separating the hydrogen thus prepared by pressure swing adsorption, and a step of separation of carbon dioxide from the residual gas obtained in the pressure swing adsorption. The reforming units for the endothermal and autothermal reforming steps are arranged parallel to one another or in series.

A method is disclosed for producing a chiral gel. A polymer including chiral monomers, such as a protein, is dissolved to generate a sol, which is optionally dialyzed. The sol is contacted with a crystallization inhibitor that allows it to form a gel. The gel in wet or dried form is useful for performing chiral separations.