The invention relates to a cleaning
system for a selection plating product developing process. The
system comprises a developing bath, a releasing and rinsing bath, a
neutralization bath, a front rinsing bath, a cleaning bath and a rear rinsing bath, wherein the front rinsing bath comprises a plurality of first
branch rinsing baths which can be filled with ionized water from front to back; and the rear rinsing bath comprises a first rear rinsing bath group and a second
branch rinsing bath group from front to back, wherein the first rear rinsing bath group comprises a plurality of second
branch rinsing baths and can be filled with municipal water, and the second branch rinsing bath group comprises a plurality of third branch rinsing baths and can be filled with deionized water. The
system also comprises a
temporary storage cylinder, wherein the front rinsing bath and the second rear rinsing bath group are respectively connected with the
temporary storage cylinder and respectively used for supplying deionized water to the
temporary storage cylinder; a
sodium bicarbonate solution is supplied to the temporary storage cylinder; and the temporary storage cylinder is connected with the
neutralization bath and used for supplying neutralizing liquid to the
neutralization bath. The cleaning system for the selection plating product developing process can be used for controlling
water quality of each section and cleaning, is advantageous to smoothly removing flowing
slag, and can be used for solving the problem that a flexible
printed circuit board cannot be clearly cleaned and increasing the
utilization rate of deionized water.