The invention relates to the technical field of
capacitor processing, discloses a
metal spraying control method and
system for a thin
film capacitor, and aims to realize effective control on the
diameter of
metal spraying particles during
metal spraying operation by accurately detecting the
diameter of the metal spraying particles outside a spray gun in the metal spraying process. And the
diameter of the metal spraying particles is accurately controlled within a specific proportion interval of the thickness of the film, so that the metal spraying particles can smoothly enter a gap between the two
layers of films. In the process, the metal spraying particles are attached to the plating layer of the metallized film through the side faces, and the contact area can be effectively increased through the attaching mode. Along with the increase of the contact area, the
adhesive force of the metal spraying layer is enhanced, and the
contact resistance is reduced. The enhancement of the
adhesive force of the metal spraying layer and the reduction of the
contact resistance are beneficial for improving the
overcurrent capability and the current
impact resistance of the
capacitor, and finally the improvement of the metal spraying performance of the metallized
film capacitor is realized, so that the overall quality of the
capacitor is improved.