Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

32results about How to "Increase gas density" patented technology

Physical vapor deposition (PVD) cavity structure for improving sheet resistance uniformity of metal oxide thin film

The invention provides a physical vapor deposition (PVD) cavity structure for improving the sheet resistance uniformity of a metal oxide thin film. The PVD cavity structure comprises a cavity, a driving device, a magnetic part, a target material, an upper baffle, a lower baffle, a wafer and the like. The upper baffle is in an inverted conical barrel shape, the outer edge of the upper baffle is erected on an opening of the cavity, and the bottom end of the upper baffle is lower than the upper surface of a base pressing ring. The cavity is provided with an oxygen inlet, a gas inlet ring is installed at the oxygen inlet and is divided into an outer ring body and an inner ring body, the outer ring body is provided with a gas inlet, two gas outlets are separated, two separated branches of holes are connected with the inner ring body, and the holes of the inner ring are symmetrically distributed. According to the cavity structure, gas cannot be immediately pumped away from the gap between the upper baffle and the lower baffle after entering the cavity, gas flow generates a vector in the direction toward the center in the gas pumping process, and the reactant gas concentration at the center of the wafer is improved; and due to the fact that mixed gas feeding is changed into independent gas feeding, gas flow distribution is uniform, dispersivity is good, the oxygen inlet and the argon inlet are separated, oxygen can be better stirred by argon, and oxygen distribution is more uniform.
Owner:中科微机电技术(北京)有限公司

Hall thruster with novel buffer cavity

The invention discloses a Hall thruster with a novel buffer cavity, and belongs to the technical field of Hall thrusters. The Hall thruster with the novel buffer cavity solves the problems that in thecase of an existing low-power Hall thruster, due to the fact that the size is too small, gas density and homogenization degree are not high. An inner ceramic screen and an outer ceramic screen of theHall thruster with the novel buffer cavity are of an inside-and-outside nested cylindrical structure, a radial gap and an axial gap are formed between the inner ceramic screen and the outer ceramic screen, so that a buffer cavity structure between the inner ceramic screen and the outer ceramic screen is formed, an anode and the outer ceramic screen are fixedly mounted on a bottom plate through agas distributor and a nut, an inner permanent magnet is fixedly mounted in the inner ceramic screen through a permanent magnet support, and is fixedly mounted on the bottom plate through a fixing nut,and an outer permanent magnet is mounted on the outer side of the outer ceramic screen in a sleeving mode. A discharge channel of the Hall thruster with the novel buffer cavity is formed by insertingthe outer ceramic screen and the inner ceramic screen, the buffer cavity is formed at the area between the outer ceramic screen and the inner ceramic screen, a gas motion path is enlarged through thenovel buffer cavity structure, and gas is more sufficiently homogenized.
Owner:HARBIN INST OF TECH

Multifunctional overwater first-aid kit

The invention relates to a multifunctional overwater first-aid kit, which comprises a kit body and a kit cover, a photovoltaic power generation panel and an operation panel are arranged on the kit cover, and the operation panel comprises an air supply assembly, a signal assembly and a power supply assembly; wherein the box body comprises a first chamber, a second chamber and a third chamber; the third chamber is located at the bottom of the box body and is internally provided with a battery connected with the photovoltaic power generation panel; the first chamber and the second chamber are arranged above the third chamber; an oxygen production device is vertically mounted in the second chamber; the oxygen generating device comprises an oxygen pipe, a hydrogen pipe and a water inlet pipe located between the oxygen pipe and the hydrogen pipe. The bottoms of the oxygen pipe and the hydrogen pipe are respectively communicated with the bottom of the water inlet pipe; a positive electrode electrolysis head is arranged at the bottom of the oxygen pipe, a negative electrode electrolysis head is arranged at the bottom of the hydrogen pipe, the oxygen generation device is connected with a gas supply assembly on the operation panel, a wire groove is formed between the third cavity and the first cavity, and floating blocks are symmetrically inserted into the two sides of the wire groove.
Owner:李爱群

Atomization device for pulmonary infection

The atomization device comprises a medicine mixing device for mixing different medicines together, a liquid outlet pipe is arranged at the lower end of the medicine mixing device, a partition plate I is fixedly connected to the lower end of the liquid outlet pipe, a partition plate II is slidably connected to the lower end of the partition plate I, and through holes I are formed in the partition plate I and the partition plate II in a penetrating mode; a high-pressure air pipe is arranged at the lower end of the partition plate II, high-pressure gas is injected into the high-pressure air pipe through a compressor, the amount of the medicine flowing out of the medicine mixing tank and the amount of the medicine flowing into the high-pressure air pipe are controllable through sliding between the partition plate I and the partition plate II, and therefore the amount of the medicine contained in the gas is controlled; the high-pressure air pipe is in an L shape so that high-pressure airflow can carry medicine to impact the inner wall of the high-pressure air pipe so that medicine particles can be dispersed, meanwhile, a dispersing net is arranged at the upper end of the high-pressure air pipe so that the medicine particles can be cut and further dispersed, and it is guaranteed that the medicine particles inhaled by a patient are small enough and cannot be combined with sputum to further block the trachea of the patient.
Owner:HENAN UNIV HUAIHE HOSPITAL

Formation method of semiconductor structure

A formation method of a semiconductor structure comprises the following steps of providing a substrate, wherein a through hole is formed in the substrate; forming metal layers on a substrate surface, a through hole bottom and a sidewall surface; providing a lithography processing chamber, wherein pressure in the lithography processing chamber and pressure outside the lithography processing chamber possess a pressure difference, a pressure difference lithography technology is adopted in the lithography processing chamber, a photoresist layer is formed on a part of the metal layer surfaces, the photoresist layer closes the through hole and a gas is arranged in the through hole; taking the photoresist layer as a mask film, etching the metal layers till that a substrate surface is exposed and taking the residual metal layers as a redistribution layer; and removing the photoresist layer. By using the method of the invention, quality of the formed photoresist layer is increased; a thickness of the photoresist layer is avoided to be too thin or fracture is avoided; unnecessary etching to the metal layers of the through hole bottom and the sidewall surface is avoided too; quality of the formed redistribution layer is improved so that reliability and electric performance of the semiconductor structure are increased.
Owner:SEMICON MFG INT (SHANGHAI) CORP

A kind of multifunctional aquatic first aid kit

The invention relates to a multifunctional first aid kit on water, which includes a box body and a box cover, and the box cover is provided with a photovoltaic power generation panel and an operation panel, and the operation panel includes an air supply assembly, a signal assembly and a power supply assembly; the box The body includes a first chamber, a second chamber and a third chamber. The third chamber is located at the bottom of the box and is equipped with a battery connected to a photovoltaic power generation panel. The first chamber and the second chamber The chamber is arranged above the third chamber, and an oxygen generating device is vertically installed in the second chamber, and the oxygen generating device includes an oxygen pipe, a hydrogen pipe and a water inlet pipe between the two, the oxygen pipe and the The bottoms of the hydrogen pipes communicate with the bottoms of the water inlet pipes respectively. The bottom of the oxygen pipes is provided with a positive electrode electrolysis head, and the bottom of the hydrogen pipes is provided with a negative electrode electrolysis head. The oxygen generator is connected with the gas supply assembly on the operating panel. A wire groove is provided between the third chamber and the first chamber, and floating blocks are inserted symmetrically on both sides of the wire groove.
Owner:李爱群

A low-pressure flash pyrolysis flow tube reaction device based on a continuous molecular beam source

The invention belongs to the technical field of pyrolysis instruments, in particular to a low-pressure flash pyrolysis flow tube reaction device based on a continuous molecular beam source. It includes a test bench, an installation mechanism, a flash pyrolysis mechanism and a vacuum box; the flash pyrolysis mechanism includes a cylindrical cavity horizontally arranged in the vacuum box, and a sample injection pipe, a water inlet pipe and a water outlet pipe arranged in the cylindrical cavity, and a water cooling chamber It is slidably arranged in the cavity at the other end of the cylindrical cavity, the other end of the injection tube penetrates the water cooling cavity, and the extension end is connected with a silicon carbide tube, and a pair of graphite electrodes is sleeved on the silicon carbide tube; the extension end of the push rod of the linear introducer A sliding table is arranged in the corresponding cylindrical cavity, the extension end of the push rod is fixedly connected with the sliding block, and the upper end of the sliding block is fixedly connected with the corresponding sampling tube. The silicon carbide tube of the invention is used as a reactor, and the graphite electrode is heated to realize rapid temperature rise and reduce secondary reactions, and can reduce the annihilation of active and important reaction intermediates such as free radicals under low pressure, and can realize continuous sampling and improve the reaction power of pyrolysis samples. study research.
Owner:UNIV OF SCI & TECH OF CHINA

Low-pressure flash pyrolysis flow tube reaction device based on continuous molecular beam source

The invention belongs to the technical field of pyrolysis instruments, and particularly relates to a low-pressure flash pyrolysis flow tube reaction device based on a continuous molecular beam source. The device comprises a test bed, a mounting mechanism, a flash pyrolysis mechanism and a vacuum box; the flash pyrolysis mechanism comprises a cylindrical cavity horizontally arranged in the vacuum box, and a sample injection pipe, a water inlet pipe and a water outlet pipe which are arranged in the cylindrical cavity, the water cooling cavity is slidably arranged in a cavity body at the other end of the cylindrical cavity, the other end of the sample injection pipe penetrates through the water cooling cavity, the extending end of the sample injection pipe is connected with a silicon carbide pipe, and the silicon carbide pipe is sleeved with a pair of graphite electrodes; and a sliding table is arranged in the cylindrical cavity corresponding to the extension end of a push rod of the linear introducer, the extension end of the push rod is fixedly connected with a sliding block, and the upper end of the sliding block is fixedly connected with a corresponding sample injection pipe. The silicon carbide tube is used as a reactor, the graphite electrode is used for heating, rapid heating is achieved, secondary reaction is reduced, annihilation of active and important reaction intermediates such as free radicals can be reduced under low pressure, continuous sampling can be achieved, and reaction kinetics research of pyrolysis samples can be perfected.
Owner:UNIV OF SCI & TECH OF CHINA

Formation method of semiconductor structure

A formation method of a semiconductor structure comprises the following steps of providing a substrate, wherein a through hole is formed in the substrate; forming metal layers on a substrate surface, a through hole bottom and a sidewall surface; providing a lithography processing chamber, wherein pressure in the lithography processing chamber and pressure outside the lithography processing chamber possess a pressure difference, a pressure difference lithography technology is adopted in the lithography processing chamber, a photoresist layer is formed on a part of the metal layer surfaces, the photoresist layer closes the through hole and a gas is arranged in the through hole; taking the photoresist layer as a mask film, etching the metal layers till that a substrate surface is exposed and taking the residual metal layers as a redistribution layer; and removing the photoresist layer. By using the method of the invention, quality of the formed photoresist layer is increased; a thickness of the photoresist layer is avoided to be too thin or fracture is avoided; unnecessary etching to the metal layers of the through hole bottom and the sidewall surface is avoided too; quality of the formed redistribution layer is improved so that reliability and electric performance of the semiconductor structure are increased.
Owner:SEMICON MFG INT (SHANGHAI) CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products