4results about How to "Reduce reflective effect" patented technology

This invention provides a reflective photomask blank and a reflective photomask suppressing or reducing the shadowing effect of a reflective photomask for patterning transfer using a light having a wavelength in the extreme ultraviolet region as a light source and having high interlayer adhesion between a capping layer and a low reflective part. A reflective photomask blank (10) according to this embodiment includes a substrate (1), a reflective part (5), and a low reflective part (4), in which the reflective part (5) includes a multi-layer reflective film (2) and a capping layer (3), the capping layer (3) contains Ru, the low reflective part (4) contains 40 at% or more of a material selected from Ag, Co, In, Pt, Sn, Ni, and Te, and compounds thereof, and a region at least 2 nm thick from the capping layer (3) side of the low reflective part (4) contains 25 at % or more of a material belonging to a first material group or 30 at% or more of a material belonging to a second material group, and the total film thickness of the low reflective part (4) is 45 nm or less.

The application discloses a kind of low reflection high adhesive photo surface treatment method, successively contain photo surface plasma treatment, UV film solution coating solidification, film outer surface plasma treatment etc., core is in UV film solution adding silane coupling agent type passivator;Photo surface uses atmospheric pressure plasma treatment, film outer surface uses low temperature plasma treatment, by controlling plasma treatment power, speed, working gas etc., realize the micro-nano rough structure construction of photo and film outer surface.The application utilizes double plasma treatment to realize physical roughening and reduce reflection, realizes the stability and chemical coupling of plasma activated surface by passivator, greatly improves the bonding strength of photo and film layer, and finally prepared film encapsulation photo film layer transmittance is greater than or equal to 90%, 60 degree glossiness is 10~30GU, while realizing low reflection effect without losing transparency, also has excellent wear resistance, bending performance.

There are provided a reflective photomask blank and a reflective photomask suppressing or reducing the shadowing effect of a reflective photomask for patterning transfer using a light having a wavelength in the extreme ultraviolet region as a light source and having hydrogen radical resistance. A reflective photomask blank (10) according to this embodiment includes: a substrate (1); a reflective part (5); and a low reflective part (4) in this order, in which the low reflective part (4) includes a multi-layer reflective film (2) and a capping layer (3), the low reflective part (4) contains a high extinction coefficient material, Ta, and at least one of a material group consisting of Ti, Nb, W, and Mo and contains the high extinction coefficient material in a proportion larger than 50 at%, the content ratio of the at least one of the material group consisting of Ti, Nb, W, and Mo in the low reflective part (4) is equal to or less than the content ratio of Ta, the total film thickness of the low reflective part (4) is 45 nm or less, and the OD value of the low reflective part (4) is 1.0 or more.

The utility model discloses a centering beacon which comprises a centering rod, an elastic sleeve, a reflective coating and a plurality of shading fins, according to the application, the reflective coating is arranged on the elastic sleeve, the elastic sleeve can slide up and down on the centering rod and is fixed, the centering bolt is mounted on the forced centering disc during use, and the height difference between the reflective coating and the forced centering disc is obtained through measurement; the centering beacon which can only be used for orientation originally is changed into the centering beacon which can be used for accurately measuring the target height, so that the free station setting function of the total station is realized (space resection), and the cost is not increased; through the cooperation of the plurality of shading fins and the elastic sleeve, the influence of an arc curved surface at the reflective coating on light signal reflection is reduced, a more accurate and stable prism constant (distance correction number) can be obtained, the shading fins are used for shielding the range of large curvature change of the side edge of the cylinder, and the influence of the curvature on the distance correction number is reduced.