17 results about "Thiocarbamide derivatives" patented technology

The present application provides a polarizing plate capable of inhibiting the decrease in transmittance in a high-temperature environment and having excellent water resistance. Provided is a polarizing plate having a polarizing element in which a dichroic dye is adsorbed to a polyvinyl alcohol-based resin layer and the dichroic dye is oriented, and a transparent protective film laminated to at least one face of the polarizing element, the polarizing element and the transparent protective film being bonded by an adhesive layer formed of an adhesive containing a urea-based compound and a dialdehyde, the urea compound being at least one selected from the group consisting of urea, a urea derivative, thiourea, and a thiourea derivative, and the water content of the polarizing element being equal to or higher than the equilibrium water content at 20°C and 30% RH and equal to or lower than the equilibrium water content at 20°C and 50% RH.

Provided is a polarizing plate in which the decrease in transmittance in a high-temperature environment is suppressed. A polarizing plate has a polarizing element in which a dichroic dye is adsorbed and oriented in a polyvinyl alcohol-based resin layer, a first transparent protective film laminated on one face of the polarizing element, and a second transparent protective film laminated on the other face of the polarizing element, the polarizing element and the transparent protective films being bonded with a first adhesive layer formed from a first adhesive containing a first compound, the polarizing element and the second transparent protective film being bonded with a second adhesive layer formed from a second adhesive containing a second compound, the first compound being at least one selected from the group consisting of urea, a urea derivative, thiourea, and a thiourea derivative, and the second compound being a compound having a nitroxyl radical or a nitroxide radical.

The application discloses a kind of double S-alkyl isothiourea derivatives, its preparation method and application, belong to biochemical technical field.The double S-alkyl isothiourea derivative is the compound shown in general formula 1 or its pharmaceutically acceptable salt, in formula, R is saturated alkane or unsaturated alkane;X is any one of i, ii and iii;I is branched C1-C 20 Saturated alkane or straight-chain C1-C 20 Saturated alkane;II is unsaturated alkane;III is heteroatom-substituted alkane.The application further discloses a preparation method and application of the above-mentioned double S-alkyl isothiourea derivative, a stapled peptide and a preparation method thereof.The double S-alkyl isothiourea derivative of the application can be used for stapled peptide synthesis, and the obtained stapled peptide containing guanidyl structure has the advantages of good water solubility and strong membrane permeability in addition to various advantages of traditional all-carbon hydrogen stapled peptide in polypeptide structure modification.

The present invention relates to methods of treating endometriosis or preventing recurrence of endometriosis. In particular, the present invention relates to a method of treating endometriosis and relapse thereof, comprising administering to a woman suffering from endometriosis a pharmaceutical composition comprising an S-alkyl isothiourea derivative, in particular S-ethyl isothiourea diethyl phosphate. The methods and pharmaceutical compositions of the present invention can retain fertility and can be fertilized.

The invention relates to the technical field of olefin polymerization catalysts, and discloses a thiourea derivative-containing catalyst component as well as a preparation method and application thereof. The catalyst component contains an inorganic oxide and an active component, the active component is a reaction product of titanium halide, magnesium halide, an alkyl thiourea derivative compound and an electron donor compound, and based on the total weight of the catalyst component, the content of the inorganic oxide is 5-50 wt%, and the content of the active component is 50-95 wt%. The catalyst component is used for olefin polymerization reaction after being activated, and the prepared polymer has higher melt index and low oligomer content.

To suppress polyene formation in a polarizer made of a polyvinyl alcohol resin film.SOLUTION: A polarizing plate 100 includes a polarizer 101 in which a dichroic dye is adsorbed and aligned on a polyvinyl alcohol-based resin film, and a protective film 103 laminated on at least one surface of the polarizer 101 via an adhesive layer 102. The adhesive layer 102 contains a urea compound. The polarizer 101 contains a radical scavenger. The urea compound is at least one selected from the group consisting of urea, urea derivatives, thiourea, and thiourea derivatives. The radical scavenger is a hindered amine compound.SELECTED DRAWING: Figure 1

The invention relates to the field of advanced packaging semiconductor driving chips, and discloses a gold etching solution, application thereof and a method for electroplating gold-silver alloy on an etched wafer. The gold etching liquid comprises a complexing agent, an oxidizing agent, an aluminum protective agent and a solvent; wherein the complexing agent comprises a main complexing agent and an auxiliary complexing agent; the main complexing agent is selected from thiourea and / or thiourea derivatives; the auxiliary complexing agent is selected from at least one of butyl xanthate, isoamyl xanthate, thionocarbamate and diethyl phosphonate; the weight ratio of the complexing agent to the oxidizing agent to the aluminum protective agent to the solvent is 1: (0.2-1.5): (0.2-1.5): (20-30). The gold etching liquid has mild oxidability, can selectively etch a PVD gold seed layer, avoids etching a gold-silver alloy bump, does not cause serious deformation of the gold-silver alloy bump, avoids damage of etching to an aluminum circuit in a wafer, and is mild in etching condition and adjustable in gold etching rate.

The invention discloses a bactericidal compound for preventing and treating plant fungal diseases and application, and belongs to the technical field of pesticides. According to the bactericidal compound disclosed by the invention, the bactericidal compound formed by combining a citral acylthiourea derivative LN-3Cl with kresoxim-methyl, combining a citral acylthiourea derivative LN-3F with thiophanate-methyl and combining a citral acylthiourea derivative LN-3OCH3 with tricyclazole can be used for preventing and treating rhizoctonia solani; the bactericidal compound formed by combining the citral acylthiourea derivative LN-3Br and the thiophanate-methyl can be used for preventing and treating phytophthora nicotianae; the germicidal compound formed by combining the citral acylthiourea derivative LN-2CH3 with chlorothalonil and combining the citral acylthiourea derivative LN-4CH3 with tebuconazole can be used for preventing and treating colletotrichum caringenum. As a synergistic component of an agricultural bactericide, the citral acylthiourea derivative remarkably improves the bactericidal activity, and the synergistic coefficient SR of the citral acylthiourea derivative is greater than 1.5.

Crosslinked polymeric particles obtainable by copolymerization, in the presence of a chain transfer reagent, of at least one difunctional radically polymerizable monomer, optionally at least one monofunctional radically polymerizable monomer and at least one thiourea derivative according to the following Formula (I):in which R is an (n+1)-valent, aromatic, aliphatic, linear or branched C1-C50 hydrocarbon radical, which can be interrupted by one or more, preferably 1 to 8, particularly preferably 1 to 6, ether, thioether, ester, amide or urethane groups; PG is a radically polymerizable (meth)acrylate, (meth)acrylamide or vinyl group and n is 1 or 2. In combination with a hydroperoxide, the crosslinked polymeric particles are suitable as redox initiator system for the free-radical polymerization of compositions comprising at least one radically polymerizable monomer. These compositions are particularly suitable as dental materials.

One aspect of the invention is a dental composition of a single-component dental composition including a (meth)acrylate, a photopolymerization initiator, a thiourea derivative, a water miscible organic solvent, and water, wherein the photopolymerization initiator contains a diaryliodonium salt.

This application relates to the field of coalbed methane extraction reagents technology, and particularly to a multi-effect corrosion and scale inhibitor with both scale inhibition and corrosion inhibition functions, and its preparation method. The raw materials of the multi-effect corrosion and scale inhibitor, by weight, satisfy the following: thiourea derivative: 15-30 parts, polyacrylate metal salt: 5-10 parts, hydroxyasiatic acid: 5-10 parts, and water; wherein the thiourea derivative contains sulfur atoms, multiple nitrogen atoms, and multiple phosphate groups. This multi-effect corrosion and scale inhibitor improves its scale inhibition and corrosion inhibition properties through the synergistic effect of the thiourea derivative, polyacrylate metal salt, and hydroxyasiatic acid at the molecular level.

The invention belongs to the technical field of metal surface treatment, and particularly relates to an alkaline zinc-nickel plating solution suitable for a low-temperature freeze-thaw environment, which comprises the following components in parts by weight: 10-15 parts of zinc oxide, 5-10 parts of nickel sulfate hexahydrate, 20-30 parts of tetraethylenepentamine, 20-25 parts of diethylenetriamine, 35-55 parts of triethanolamine, 80-120 parts of sodium hydroxide, 20-30 parts of 1, 2, 4-trimethyl-1, 3-pentanediol monoisobutyrate, 20-30 parts of 1, 2, 4-trimethyl-1, 3-pentanediol monoisobutyrate, 20-30 parts of sodium hydroxide, 20-30 parts of The cleaning agent is prepared from the following components in parts by weight: 0.01 to 0.05 part of 1, 10-phenanthroline, 0.05 to 0.2 part of polyethylene glycol, 0.2 to 1 part of thiourea derivative, 10 to 20 parts of glycerol, 0.01 to 0.05 part of lauryl sodium sulfate and 20 to 40 parts of tetrahydroxypropyl ethylenediamine. A zinc-nickel electroplated layer prepared by the alkaline zinc-nickel plating solution has relatively strong toughness and binding force and relatively high corrosion resistance in a low-temperature freezing and thawing environment, in addition, the preparation method of the alkaline zinc-nickel plating solution is simple in technological process and low in equipment requirement, large-scale industrial production is favorably realized, and the alkaline zinc-nickel plating solution has relatively good comprehensive use performance.

The present application provides a polarizing plate in which the decrease in transmittance in a high-temperature environment is suppressed. A polarizing plate has a polarizing element in which a dichroic dye is adsorbed to a polyvinyl alcohol-based resin layer and the dichroic dye is oriented, and a transparent protective film laminated to at least one face of the polarizing element, the polarizing element and the transparent protective film are bonded by an adhesive layer formed by an adhesive containing a urea-based compound and a dicarboxylic acid, the urea-based compound is at least one selected from urea, a urea derivative, thiourea, and a thiourea derivative, and the water content of the polarizing element is equal to or higher than the equilibrium water content at 20°C and 30% RH and equal to or lower than the equilibrium water content at 20°C and 50% RH.

The application relates to the field of advanced packaging semiconductor driving chips, and discloses a gold etching solution, application of the gold etching solution and a method for etching a wafer electroplated gold-silver alloy. The gold etching solution comprises a complexing agent, an oxidizing agent, an aluminum protective agent and a solvent; wherein the complexing agent comprises a main complexing agent and an auxiliary complexing agent; the main complexing agent is selected from thiourea and / or a thiourea derivative; the auxiliary complexing agent is selected from at least one of butyl xanthate, isoamyl xanthate, thiuram disulfide and diethyl phosphonate; and the weight ratio of the complexing agent: the oxidizing agent: the aluminum protective agent: the solvent is 1:(0.2-1.5):(0.2-1.5):(20-30). The gold etching solution has mild oxidizing property, can selectively etch a PVD gold seed layer, avoids etching the gold-silver alloy bump itself, does not cause the gold-silver alloy bump to appear serious deformation, avoids damage to aluminum lines in the wafer caused by etching, and has mild etching conditions and adjustable gold etching rate.

The present invention relates to novel compounds for the treatment, alleviation or prevention of a group of diseases, disorders and abnormalities which are responsive to the modulation or inhibition of the activation of a component of the NLRP3 inflammasome pathway. In particular, the component of the inflammasome pathway is a NOD-like receptor (NLR) family, pyrin domain-containing protein 3 (NLRP3) inflammasome. More particularly, the compounds of the present invention have the capability to modulate the NLRP3 inflammasome pathway. Further, the compounds of the present invention are suitable for the treatment, alleviation or prevention of a group of diseases, disorders and abnormalities which are responsive to the modulation, in particular decrease, IL-1 beta and / or IL-18 levels.

The structure of the thiourea derivative is shown in the specification, and R1 is selected from any one of isopropyl, isobutyl, tertiary butyl, furyl, thienyl, phenyl and pyridyl; r2 is selected from any one of hydrogen, amino, hydroxyl, halogen and methyl; x is selected from any one of C and N; y is selected from any one of C and N; z is H or hydroxyl; n is 1 or 2. The thiourea derivative provided by the invention can activate TLR2, and has an immunostimulatory activity effect on human PBMC.

This application discloses a photoresist stripping solution composition and its preparation method, relating to the field of electronic materials technology. The composition comprises 5-10% potassium hydroxide, 2-5% fatty acid, 10-20% benzyl alcohol, 15-25% monoethanolamine, 4.6-15.5% combined additives, and a solvent as the balance. The combined additives include benzotriazole and thiourea derivatives as metal protectants, and fluorocarbon surfactants and ethylene glycol butyl ether as penetration enhancers. This application optimizes the composition of the combined additives to enhance penetration performance and synergistically combines the combined additives with monoethanolamine and fatty acids to prevent the formation of a dense protective film on the metal. This reduces metal corrosion without affecting the photoresist removal effect, resulting in a photoresist stripping solution composition prepared by this method that improves stripping efficiency and effectively protects the metal.