The invention relates to the technical field of
wafer surface detection, and discloses a light
waveguide wafer surface detecting device which comprises a multi-direction movement platform capable of moving in multiple directions of the horizontal plane, a
laser confocal scanning measurement head and a fixed support.Due to the
laser confocal scanning measurement head, by directly scanning a to-be-detected
wafer, the warp rate and other data can be measured and the
residual stress data of the surface of the wafer can be calculated, and ditches and other structural characteristics on the surface of the to-be-detected wafer can be directly obtained through scanning; the
residual stress, ditches and other characteristics of the surface of the wafer can be detected at the same time and are prevented from being forwarded to different machines to be detected multiple times, the number of detection times of the surface of the wafer is greatly decreased, detection efficiency and precision are both high, and operation is convenient and rapid; in addition, due to the multi-direction movement platform, the to-be-detected wafer can be moved in multiple directions, the comprehensive scanning detection of the
laser confocal scanning measurement head is greatly facilitated, the labor intensity of operators can be lowered, the time required by detection is shortened, and work efficiency is greatly improved.