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4results about How to "Resolve slow performance" patented technology

Domain name resolution method and device based on domain name request risk management and control

ActiveCN115695373BReduce load pressureQuick screeningSecuring communicationDomain nameData set
The application discloses a domain name resolution method and device based on domain name request risk management and control, the method comprises the following steps: identifying domain name requests as normal domain name requests or abnormal domain name requests; according to the user domain name access behavior data set and the abnormal domain name association strength, evaluating the security rating and the security score of the user; sending the normal domain name requests initiated by users with different security ratings to the DNS server subset cluster corresponding to their levels, so that the DNS server subset cluster of the level responds to the normal domain name requests in order based on the security score; predicting the normal domain names with high probability of access to form a domain name resource list, which is used to cache the domain name resource list to the selected DNS server when the security rating of the user is higher than the set threshold, so as to improve the domain name resolution cache hit rate and the resolution efficiency. The application solves the problem of reduced performance of the domain name server caused by the low utilization rate of the conventional DNS server due to the zombie network attack.
Owner:INST OF SOFTWARE - CHINESE ACAD OF SCI

Semiconductor element and method for forming the same

PendingCN122340876AResolve slow performanceImprove breakdown voltageDevice materialDielectric layer
This invention discloses a semiconductor device and a method for forming the same, wherein the semiconductor device includes: a semiconductor substrate; a gate structure located on the semiconductor substrate; a source region and a drain region located in the semiconductor substrate and on opposite sides of the gate structure; a sacrificial oxide layer located on the semiconductor substrate; a contact etch stop layer located on the sacrificial oxide layer; a lower interlayer dielectric layer located on the contact etch stop layer; a high-resistivity dielectric layer located on the gate structure and the lower interlayer dielectric layer; and a high-resistivity field plate, wherein the high-resistivity field plate is at least partially located on the high-resistivity dielectric layer.
Owner:POWERCHIP SEMICON MFG CORP

PLC platform embedded LPV prediction control method and device and computer equipment

PendingCN121806537AResolve slow performanceimprove performanceSimulator controlDatasheetProcess equipment
The invention relates to a PLC platform embedded LPV prediction control method and device and computer equipment, and the method comprises the steps: collecting the scheduling parameters and output measurement values of process equipment in real time; determining a corresponding discrete matrix according to the scheduling parameters and a pre-constructed structured data table; determining an adjusting signal according to the output measurement value and the discrete matrix; collecting an input signal and output response data of the process equipment; constructing a continuous system model corresponding to predefined scheduling parameters according to the input signal and the output response data; performing discretization calculation on the continuous system model to obtain a target discrete matrix set; and constructing a structured data table according to predefined scheduling parameters and the target discrete matrix set. According to the method and the device, the problem of performance reduction caused by discrete matrix online calculation in related technologies is solved, and the performance of the prediction control method is improved in a computing power limited scene.
Owner:CHINA TOBACCO ZHEJIANG IND CO LTD

Method and system for qualitatively analyzing flow through temperature difference before and after pipeline heating

PendingCN121987904AImprove compatibilitySolve the problem of unstable humidification performanceRespiratorsThermodynamicsTemperature difference
The invention is suitable for the technical field of respiratory support equipment, and relates to a method and system for qualitatively analyzing flow through the temperature difference before and after a heating pipeline, and the method comprises the following steps: S10, obtaining a first temperature value T0 at the inlet of the heating pipeline and a second temperature value T1 at the outlet of the heating pipeline; s20, the temperature difference delta T is calculated according to the formula: delta T = T1-T0; s30, the gas flow is divided into a plurality of qualitative gears according to the relation between the temperature difference delta T and a preset threshold value; and S40, the heating power is adjusted according to the qualitative gear. The method is simple in process and convenient to operate, the gas flow in the pipeline is qualitatively judged according to the temperature difference between the front temperature sensor and the rear temperature sensor of the heating breathing pipeline, and therefore the defect that the humidifier cannot actively obtain the flow is overcome.
Owner:HUNAN MICOME ZHONGJIN MEDICAL SCI & TECH DEV CO LTD