The invention discloses a mask plate and a manufacturing method of the mask plate. The mask plate comprises a substrate, a mask graph layer, a protection layer and a first sacrificial layer. The substrate comprises a first surface and a second surface reverse to the first surface, multiple openings penetrating the substrate are formed in the substrate, the substrate can use the semiconductor etching process to carry out imaging, the mask graph layer is located on the first surface and comprises a graph area and a shielding area which are adjacent, the graph area is provided with at least one through hole penetrating the mask graph layer, the openings are exposed out of the graph area, each graph area corresponds to the openings, the protection layer is located at the position, on the side,back onto the substrate, of the mask graph layer, of the surface of the shielding area, and the first sacrificial layer is located between the mask graph layer and the protection layer. The mask plate is made through the semiconductor process, compared with a metal mask plate made through the traditional chemical etching manner, the semiconductor process can improve the quality of the mask plateand the through hole precision, the through hole size is reduced, the mask graph layer thickness is reduced, the mask graph layer and the substrate can be prevented from shifting, and the mask plate quality and the precision are higher.