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140 results about "Proton acceptor" patented technology
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A proton acceptor is another name for a base, which is the opposite of an acid. In the Broensted-Lowry definition, a base is a negatively charged ion that will react with, or accept, a positively charged hydrogen ion. Since a hydrogen ion is aproton, the base is called a proton acceptor.
Ion-pair delivery system for cosmetic and pharmaceutical compositions
InactiveUS20040228884A1Reduce skin irritationProvide benefitsBiocideCosmetic preparationsElectron donorBonding process
This invention relates to a novel ion-pair delivery system useful for cosmetic, pharmaceutical, and topical nutraceutical applications in which the functional performance and consumer aesthetics of an electron donor composition and an electron acceptor composition, or a proton donor composition and a proton acceptor composition, are synergistically enhanced when such compositions are combined in an ion-pair mode. During ion-pair bonding process, the electron donor composition or the proton acceptor composition become positively charged and the electron acceptor composition or proton donor composition become negatively charged and thus bind together in an ionic manner. Such ion-pair compositions release their electronically bound components in their original state when such compositions are absorbed into skin and reach physiological pH conditions.
Owner:GUPTA SHYAM K
Proton conductor
InactiveUS20050197467A1Easy to evaporateExcellent proton conductionSolid electrolytesConductive materialSimple Organic CompoundsElectrical conductor
An acidic group-containing polymer which has an acidic group such as sulfonic acid group, phosphoric acid group, and phosphonic acid group, and a proton acceptor which has a boiling point at 1 atmosphere higher than 100° C. and which functions as a medium for conducting proton dissociated from the acidic group are retained in pores of a porous member. Preferred examples of the proton acceptor include a salt structure composed of an anion and a cation derived from a basic organic compound, a basic organic compound, and a dissociation-facilitating polymer which facilitates dissociation of proton. Any one of the acidic group-containing polymer and the proton acceptor may be retained first, or both may be retained simultaneously.
Owner:HONDA MOTOR CO LTD
Methods for monitoring photoresists
InactiveUS20030036006A1Easy to prepareSufficient amountPhotomechanical exposure apparatusPhotosensitive material processingResistFluorescence
Methods of the invention include fluorescence microscopy inspection of an imaged resist layer prior to any type of development processing. Preferred resists for use in the methods of the invention contain a component that facilitates monitoring of a resist coating layer, particularly a component that can function as a proton acceptor and have a change in fluorescence upon exposure to radiation reemployed to pattern an image in the resist coating layer.
Owner:SHIPLEY CO LLC +1
Hair Care and Nail Care Compositions Based on Ion-Pair Delivery System for Gender and Ethnic Selective Applications
InactiveUS20040241114A1Good synergyImprove bioavailabilityCosmetic preparationsHair removalElectron donorDelivery system
This invention relates to a novel ion-pair delivery system useful for gender and ethnic background selective hair care and nail care applications in which an electron donor composition and an electron acceptor composition, or a proton donor composition and a proton acceptor composition, or an anionic and a cationic composition, are combined synergistically. The bioavailability, deposition, functional performance, and consumer aesthetics of the compositions thus combined in such ion-pairs are enhanced synergistically. Hair care compositions, such as shampoo, conditioner, hair lotion, hair oil, hair gel, hair sheen, hair rinse, hair balm, hair wax, hair spray, and such, and nail care compositions, such as nail enamel, nail creams, nail serums, nail lacquers, nail spray, and nail polish, and such, can thus be obtained with synergistically enhanced performance.
Owner:GUPTA SHYAM K
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
ActiveUS20050227151A1Reduced opening sizeIso-dense bias can be minimizedSemiconductor/solid-state device manufacturingPretreated surfacesResistDevice material
A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formd on the resist pattern, wherein the interpolymer complex film includes a network formed by a hydrogen bond between a proton donor polymer and a proton acceptor polymer.
Owner:SAMSUNG ELECTRONICS CO LTD
Positive resist composition for electron beam, x-ray or EUV and pattern forming method using the same
ActiveUS20090111047A1Good aging stabilityOrganic chemistryOrganic compound preparationActinic RaysFluence
A positive resist composition for electron beam, X-ray or EUV includes a compound having a proton acceptor functional group and capable of producing an acid radical upon irradiation with an actinic ray or radiation to reduce or lose the acceptor property or to change the proton acceptor functional group to be acidic, wherein the positive resist composition has a solid content concentration of from 2.5 to 4.5 mass %.
Owner:FUJIFILM CORP
Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same
ActiveUS7858289B2Good aging stabilityOrganic chemistryOrganic compound preparationActinic RaysFluence
Owner:FUJIFILM CORP
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
ActiveUS7314691B2Reduced opening sizeIso-dense bias can be minimizedSemiconductor/solid-state device manufacturingPretreated surfacesResistDevice material
A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formd on the resist pattern, wherein the interpolymer complex film includes a network formed by a hydrogen bond between a proton donor polymer and a proton acceptor polymer.
Owner:SAMSUNG ELECTRONICS CO LTD
Metal oxide-organic hybrid materials for heterogeneous catalysis and methods of making and using thereof
ActiveUS20150065339A1Improve robustnessPreparation by oxidation reactionsPlatinum group organic compoundsElectrolysisCobalt
Catalysts prepared from abundant, cost effective metals, such as cobalt, nickel, chromium, manganese, iron, and copper, and containing one or more neutrally charged ligands (e.g., monodentate, bidentate, and / or polydentate ligands) and methods of making and using thereof are described herein. Exemplary ligands include, but are not limited to, phosphine ligands, nitrogen-based ligands, sulfur-based ligands, and / or arsenic-based ligands. In some embodiments, the catalyst is a cobalt-based catalyst or a nickel-based catalyst. The catalysts described herein are stable and active at neutral pH and in a wide range of buffers that are both weak and strong proton acceptors. While its activity is slightly lower than state of the art cobalt-based water oxidation catalysts under some conditions, it is capable of sustaining electrolysis at high applied potentials without a significant degradation in catalytic current. This enhanced robustness gives it an advantage in industrial and large-scale water electrolysis schemes.
Owner:YALE UNIV
Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
ActiveUS20060172228A1Improve resolutionHigh sensitivityOrganic chemistryPhotomechanical apparatusOrganic acidActinic Rays
The invention provides a photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a pattern forming method using the photosensitive composition, and a specific organic acid, which are: a photosensitive composition comprising a compound having a proton acceptor functional group and producing a sulfonic acid group upon irradiation with actinic rays or radiation to reduce or lose the acceptor property or change the proton acceptor functional group to be acidic, or a compound capable of generating a specific organic acid upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; and a specific organic acid.
Owner:FUJIFILM CORP +1
Metal oxide-organic hybrid materials for heterogeneous catalysis and methods of making and using thereof
ActiveUS20160152648A1Improve robustnessPreparation by oxidation reactionsPlatinum group organic compoundsElectrolysisCobalt
Owner:YALE UNIV
Alkanolamine CO2 Scrubbing Process
ActiveUS20120063980A1Uptake efficiency can be improvedEnhance COCarbon compoundsDispersed particle separationNon-nucleophilic baseSorbent
A CO2 amine scrubbing process uses an absorbent mixture consisting of an alkanolamine CO2 sorbent in combination with a non-nucleophilic base. The alkanolamine has oxygen and nitrogen sites capable of nucleophilic attack at the CO2 carbon atom. The nucleophilic addition is promoted in the presence of the non-nucleophilic, relatively stronger base, acting as a proton acceptor. The non-nucleophilic base promoter, which may also act as a solvent for the alkanolamine, can promote reaction with the CO2 at each of the reactive hydroxyl and nucleophilic amine group(s) of the alkanolamines. In the case of primary amino alkanolamines the CO2 may be taken up by a double carboxylation reaction in which two moles of CO2 are taken up by the reacting primary amine groups.
Owner:EXXON RES & ENG CO
Resist composition and pattern forming method using the same
ActiveUS20080081282A1High resolutionHigh sensitivityPhotosensitive materialsRadiation applicationsResistSolubility
A resist composition containing: a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of from 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and a compound capable of generating a compound having a structure represented by the following formula (A-I) upon irradiation with actinic rays or radiation: Q1-X1—NH—X2-Q2 (A-I) wherein Q1 and Q2 each independently represents a monovalent organic group, provided that either one of Q1 and Q2 has a proton acceptor functional group, Q1 and Q2 may be combined with each other to form a ring and the ring formed may have a proton acceptor functional group; and X1 and X2 each independently represents —CO— or —SO2—.
Owner:FUJIFILM CORP
Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound
InactiveUS8110333B2Excellent characteristicsIncrease exposureOrganic chemistryPhotosensitive materialsResistAlcohol
A resist composition includes (A) a compound represented by the following formula (I):wherein each of R1 to R13 independently represents a hydrogen atom or a substituent, provided that at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X− represents an anion containing a proton acceptor functional group.
Owner:FUJIFILM CORP
Electronegative heteroatom-transition metal co-doped carbon-based non-noble metal electrocatalyst and preparation method thereof
PendingCN111659436AImprove catalytic performanceChange electronic structurePhysical/chemical process catalystsCell electrodesPtru catalystReaction intermediate
The invention discloses an electronegative heteroatom-transition metal co-doped carbon-based non-noble metal electrocatalyst and a preparation method thereof, and belongs to the field of new energy and electrocatalytic materials. The preparation method comprises the following steps: fully stirring and reacting a carbon source, a phosphorus source, a nitrogen source, a sulfur source and transitionmetal salt in a solvent, carrying out a solvothermal reaction, carrying out high-temperature carbonization treatment in a nitrogen atmosphere, and finally, carrying out acid washing and drying treatment to obtain the electronegative heteroatom-transition metal co-doped carbon-based non-noble metal electrocatalyst. According to the catalyst, the phosphorus source, the nitrogen source and the sulfursource are introduced in situ in the molecular synthesis process to improve the metal loading capacity and dispersity effectively, the conductivity of the catalyst is greatly improved due to the existence of the carbon material, the interaction between phosphorus and a reaction intermediate is fully utilized to form surface receptor sites with proton receptors and hydrides, and high activity is caused. The preparation method of the catalyst is simple, easily available in raw materials, low in cost, easy to control in process, short in preparation period, high in yield and suitable for large-scale production.
Owner:SHANXI INST OF COAL CHEM CHINESE ACAD OF SCI
Blend of carbon dioxide-propylene oxide copolymers and preparation method thereof
The invention provides a blend of carbon dioxide-propylene oxide copolymers, which comprises 5wt percent to 15wt percent of urethane compounds and 85wt percent to 95wt percent of carbon dioxide-propylene oxide copolymers. The urethane compounds are one kind of materials in compounds shown as from the formula I to the formula VI, wherein n is respectively 2, 4, 6 and 10, and R is methyl, ethide, propyl or butyl. Because molecules of small-molecular urethane compounds contain urethane bonds and / or hydroxide radicals and can be used as proton donors, and the carbon dioxide-propylene oxide copolymers contain carbonyls and can be used as proton acceptors, so the molecules of the urethane compounds can form stronger hydrogen bond effects with the carbon dioxide-propylene oxide copolymers, the compatibility is greatly improved, and further, the fraction elongation rate of the carbon dioxide-propylene oxide copolymers is effectively improved. The invention also provides the preparation method of the blend of the carbon dioxide-propylene oxide copolymers.
Owner:中科应化(长春)科技有限公司
Gel organosol including amphipathic copolymeric binder having hydrogen bonding functionality and liquid toners for electrophotographic applications
InactiveUS20050095524A1Increase sedimentationImproving redispersion propertyDevelopersElectrographic processes using charge patternMulti materialElectrical conductor
The invention provides liquid toner compositions in which the polymeric binder is chemically grown in the form of copolymeric binder particles dispersed in a liquid carrier. The polymeric binder includes one amphipathic copolymer comprising one or more S material portions and one or more D material portions, wherein the components of the composition comprise sufficient proton donor and proton acceptor functionality to provide a three dimensional gel of controlled rigidity which can be reversibly reduced to a fluid state by application of energy. The toners as described herein surprisingly provide compositions that are particularly suitable for electrophotographic processes wherein the transfer of the image from the surface of a photoconductor to an intermediate transfer material or directly to a print medium is carried out without film formation on the photoconductor.
Owner:S PRINTING SOLUTION CO LTD
Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound
InactiveUS20090042124A1Excellent characteristicsIncrease exposureOrganic chemistryPhotosensitive materialsResistHydrogen atom
A resist composition includes (A) a compound represented by the following formula (I):wherein each of R1 to R13 independently represents a hydrogen atom or a substituent, provided that at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X− represents an anion containing a proton acceptor functional group.
Owner:FUJIFILM CORP
Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
ActiveUS7923199B2Improve resolutionHigh sensitivityOrganic chemistryPhotomechanical apparatusOrganic acidActinic Rays
The invention provides a photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a pattern forming method using the photosensitive composition, and a specific organic acid, which are: a photosensitive composition comprising a compound having a proton acceptor functional group and producing a sulfonic acid group upon irradiation with actinic rays or radiation to reduce or lose the acceptor property or change the proton acceptor functional group to be acidic, or a compound capable of generating a specific organic acid upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; and a specific organic acid.
Owner:FUJIFILM CORP +1
Binder resin composition of toner, toner composition and preparation method thereof
InactiveUS20080090162A1Increased durabilityImprove low-temperature fixabilityDevelopersElectrographic process apparatusProtonCompound (substance)
A binder resin composition which can sharply, but reversibly, melt and solidify within a narrow temperature range, a toner composition of enhanced low-temperature fixability and durability having the binder resin composition, and a preparation method thereof. The binder resin composition of the toner includes a first polymer compound having a proton donor site in a main chain, and a second polymer compound having a proton acceptor site in a main chain.
Owner:SAMSUNG ELECTRONICS CO LTD
Resist composition and method of forming resist pattern
ActiveUS20140147790A1Reduce roughnessExcellent mask reproducibilityPhotosensitive materialsSemiconductor/solid-state device manufacturingSolubilityResist
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including: a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid generator component (B) which generates an acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0) containing an acid decomposable group that exhibits increased polarity by the action of acid and a lactone-containing cyclic group, an —SO2— containing cyclic group or a carbonate-containing cyclic group, and the acid generator component (B) including an acid generator (B1) containing a compound having a nitrogen atom exhibiting a proton acceptor property and an acid generating site capable of generating an acid upon exposure in the same molecule thereof.
Owner:TOKYO OHKA KOGYO CO LTD
Hydrated alumina composition containing ZSM-48 type molecular sieve, catalyst, preparation methods of hydrated alumina composition containing ZSM-48 type molecular sieve, and catalyst, and hydroisomerization method
ActiveCN107999141ASimple processReduce operating energy consumptionHydrocarbon by isomerisationCatalyst carriersHydration reactionMolecular sieve
The invention discloses a hydrated alumina composition containing a ZSM-48 type molecular sieve, and a preparation method thereof, and a molding body, a preparation method and applications thereof. The hydrated alumina composition contains hydrated alumina, a ZSM-48 type molecular sieve and a compound having at least two proton acceptor sites, wherein the [phi] value is less than 5. The present invention further discloses a hydroisomerization catalyst using a molding body formed from the hydrated alumina composition as a carrier, and a preparation method thereof, and a hydroisomerization method. According to the present invention, the high-strength molding body is prepared by using the hydrated alumina wet gel as the starting raw material, such that the hydrated alumina wet gel drying stepis eliminated, the total process is simplified, the total operation energy consumption is reduced, the dust pollution caused by the application of the pseudoboehmite dry glue powder as the raw material is avoided, and the working environment is greatly improved; and the obtained catalyst has high catalytic activity in the hydroisomerization reaction.
Owner:CHINA PETROLEUM & CHEM CORP +1
Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
InactiveCN102549494ASemiconductor/solid-state device manufacturingPhotosensitive materials for photomechanical apparatusActinic RaysFluence
Owner:FUJIFILM CORP
Methods for monitoring photoresists
InactiveUS6770407B2High resolutionPhotomechanical exposure apparatusPhotosensitive material processingResistFluorescence
Methods of the invention include fluorescence microscopy inspection of an imaged resist layer prior to any type of development processing. Preferred resists for use in the methods of the invention contain a component that facilitates monitoring of a resist coating layer, particularly a component that can function as a proton acceptor and have a change in fluorescence upon exposure to radiation reemployed to pattern an image in the resist coating layer.
Owner:SHIPLEY CO LLC +1
Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same
InactiveUS20130001751A1High resolutionExcellent characteristicsElectric discharge tubesSemiconductor/solid-state device manufacturingPolymer scienceActinic Rays
An actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) which includes a repeating unit (A) having an ionic structural moiety which generates an acid anion by being decomposed due to irradiation with actinic rays or radiation, a repeating unit (B) having a proton acceptor moiety, and a repeating unit (C) having a group which generates an alkali soluble group by being decomposed by the action of an acid, and the resin (P) has at least one repeating unit which is represented by the general formulae (I) to (III) below as the repeating unit (A) (the reference numerals in the general formulae represent the meaning of the description in the scope of the claims and the specifications).
Owner:FUJIFILM CORP
Alumina molded body, preparation method and use thereof, catalyst, preparation method of catalyst and hydrogenation treatment method
ActiveCN107999099ASimple processReduce operating energy consumptionCatalyst carriersOther chemical processesHydrogenation catalysisOxygen
The invention discloses an alumina molded body, a preparation method and application thereof and a production molding system. The preparation method comprises optionally drying a molded body of a phosphorus-containing hydrated alumina composition containing hydrated alumina, a compound containing at least two proton acceptor sites and a phosphorus-containing compound and having the phi value of 5or less shown in the description, and roasting the molded body in an oxygen-containing atmosphere in the presence of vapor. The invention also discloses a catalyst using the alumina molded body as a carrier and having hydrogenation catalysis effects, a preparation method thereof and a hydrogenation treatment method. The high strength molded body is prepared from hydrated alumina wet gel as a starting raw material so that the hydrated alumina wet gel drying process is avoided. In molded raw material preparation, water for preparation of the molded material from pseudo-boehmite dry glue powder is avoided so that the overall processes are reduced, overall operation energy consumption is reduced, the dust pollution caused by the use of pseudo-boehmite dry glue powder as a raw material is avoided and the working environment is greatly improved.
Owner:CHINA PETROLEUM & CHEM CORP +1
Salicylic acid and chitin-2-6-bit graft and its production
Salicylic acid and chitose-2,6 site grafter and its production are disclosed. The process is carried out by putting salicylic acid and chitose into reactor in proportion of 10:1-1:2, adding to 5-50(W / V) time dispersant of hydrochloric ether, ether, benzene, homolog or ono-protonic polar solvent, swelling for chitose by methane sulfonic acid, benzene monosulfonic acid and toluene sulfonic acid, taking pyridine or organic amine as proton acceptor, reacting at 0-30degree for 0.5-3hrs, adding into acetone to deposit reactant, neutralizing by alkali, washing by water, washing by alcohol, filtering and centrifugal separating to obtain the final product. It has better performance and effect.
Owner:河南省科学院河南省发展计划委员会地理研究所
Hydrocarbon-based nanocomposite membrane comprising polyhedral oligomeric silsequioxanes having proton donor and proton acceptor, and method for manufacturing same
ActiveUS20180208768A1Improve ionic conductivityImprove proton conductivityMaterial nanotechnologyFinal product manufactureHydrogenProton
The present invention relates to a proton conductive nanocomposite membrane and a method for manufacturing same, the proton conductive nanocomposite membrane having polyhedral oligomeric silsesquioxane (POSS) having a proton donor and POSS having a proton acceptor introduced into an aromatic hydrocarbon polymer membrane having a sulfonyl group. The nano-composite membrane of the present invention has both the POSS having a proton donor and the POSS having a proton acceptor added thereto, and thus protons (cations) that are generated are easily hopped in an ion channel by means of hydrogen bonding, and thus ionic conductivity is increased. In addition, the POSS used in the present invention has a very small size, and thus hardly obstructs proton migration in the ion channel in the polymer membrane, and thus excellent proton conductivity may be enabled. In addition, the proton conductive nanocomposite membrane by the present invention exhibits excellent mechanical strength even though the degree of sulfonation of the polymer membrane is increased.
Owner:SOGANG UNIV RES FOUND
Hydrated alumina composition containing composite molecular sieve, catalyst, preparation methods of hydrated alumina composition containing composite molecular sieve, and catalyst, and hydroisomerization method
ActiveCN107999044ASimple processReduce operating energy consumptionMolecular sieve catalystsOther chemical processesMolecular sieveHydrated alumina
The invention discloses a hydrated alumina composition containing a composite molecular sieve, and a preparation method thereof, a molding body, a preparation method and applications thereof, and a production molding system. The hydrated alumina composition contains hydrated alumina, a ZSM-22 and ZSM-48 type molecular sieve and a compound having at least two proton acceptor sites, wherein the [phi] value is less than 5. The present invention further discloses a hydroisomerization catalyst using a molding body formed from the hydrated alumina composition as a carrier, and a preparation method thereof, and a hydroisomerization method. According to the present invention, the high-strength molding body is prepared by using the hydrated alumina wet gel as the starting raw material, such that the hydrated alumina wet gel drying step is eliminated, the total process is simplified, the total operation energy consumption is reduced, the dust pollution caused by the application of the pseudoboehmite dry glue powder as the raw material is avoided, and the working environment is greatly improved; and the obtained catalyst has good catalytic activity in the hydroisomerization reaction.
Owner:CHINA PETROLEUM & CHEM CORP +1
Binder resin composition of toner, toner composition and preparation method thereof
A binder resin composition which can sharply, but reversibly, melt and solidify within a narrow temperature range, a toner composition of enhanced low-temperature fixability and durability having the binder resin composition, and a preparation method thereof. The binder resin composition of the toner includes a first polymer compound having a proton donor site in a main chain, and a second polymer compound having a proton acceptor site in a main chain.
Owner:SAMSUNG ELECTRONICS CO LTD
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