The invention discloses a preparation method of an ultra-abrasion-resistant high-transmittance zirconia thin film. The preparation method comprises the following steps that 1, a substrate is cleaned,stains on the surface of the substrate are removed, and blow-drying is conducted; 2, the cleaned substrate is placed into magnetron sputtering film coating equipment, when the vacuum degree of a sputtering cavity meets requirements, the sputtering cavity is baked, and impurity molecules in the sputtering cavity are discharged; 3, after baking is completed, the zirconia thin film is deposited at the substrate by using zirconium as a target material, adopting a radio-frequency power supply and using argon and oxygen as sputtering gas through magnetron sputtering. Under the condition that the oxygen is excessive, it is ensured that zirconium atoms can fully react with reaction gas obtain zirconia by adopting high-power radio-frequency sputtering; through high-power sputtering, it can be ensured that primary energy of the zirconium atoms is high, the zirconia thin film can be more compact and good in abrasion resistance when being deposited at the substrate, and it can be ensured that thebinding force between the film and the substrate is better; and the technological process can be controlled accurately, it is ensured that the thickness of the zirconia thin film is controllable, andrequirements for the transmittance are met.