A Hall sensor with a local groove structure of a two-dimensional
electron gas channel
barrier layer and a manufacturing method thereof, belonging to the field of
semiconductor sensors. A buffer layer, an epitaxial layer and a
barrier layer are sequentially grown on the
semiconductor substrate, and three main electrodes C are arranged on the surface of the
barrier layer. 0 、C 1 and C 2 , main
electrode C 1 and C 2 About the main
electrode C 0 Centrosymmetric, main
electrode C 0 and C 1 Between, C 0 and C 2 There is a groove structure between them, and the groove structure on both sides is about the main electrode C 0 Centrosymmetric, and the width of the groove structure is less than C 0 and C 1 or C 0 and C 2 Inter-electrode spacing, main electrode C 0 and C 1 Sensing electrodes S are arranged on the groove structure between 1 , main electrode C 0 and C 2 Sensing electrodes S are arranged on the groove structure between 2 . The invention forms grooves by shallow
etching in selected areas, retains the intact
heterojunction interface under the grooves, can take
advantage of the high mobility of two-dimensional
electron gas, and can ensure that the carriers in motion under weak
magnetic field signals can generate effectively offset, thereby increasing the detection sensitivity of the device.