The present invention discloses a
thin layer drying device, wherein a secondary
material distribution mechanism comprises a rectangular overflow trough, a U-shaped main trough, a flow stabilizing plate, a liquid infusion main
pipe and a liquid infusion tube. The upper end of the
drying column is provided with a rectangular overflow trough, the upper end of the rectangular overflow trough is provided with a U-shaped main trough, a flow stabilizing plate is provided inside the U-shaped main trough, a liquid infusion main
pipe is provided on one side of the U-shaped main trough, a plurality of liquid infusion tubes are provided between the liquid infusion main
pipe and the U-shaped main trough, and one end of the liquid infusion tube penetrates into the U-shaped main trough. The secondary
material distribution mechanism of the present invention, on the one hand, slows down the descending
kinetic energy of the mother liquid, and avoids the secondary
material distribution mechanism being directly impacted by the large flow mother liquid; on the other hand, it avoids the rapid fluctuation of the liquid level, causing the splashing of the material liquid, and effectively improves the uniformity of the mother liquid distribution. Under the action of the gravity and
surface tension of the mother liquid and the
centrifugal force of the
drying column, a complete, uniform and stable liquid film can be quickly formed on the outer surface of the drying column.