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48 results about "Isocyanide compound" patented technology

Method for preparing polythiourea by means of polymerizing multiple components of isocyanide, sulfur and amine and application of polythiourea

The invention belongs to the technical field of sulfur-containing organic polymer preparation, and discloses a method for preparing polythiourea by means of polymerizing multiple components of isocyanide, sulfur and amine and application of the polythiourea. The method includes carrying out reaction on amine monomers, isocyanide monomers and elemental sulfur in solvents; cooling, precipitating anddrying reaction products to obtain the polythiourea. The amine monomers are diamine compounds, and the isocyanide monomers are binary isocyanide compounds. The method and the application have the advantages that the method can be implemented under room-temperature and air conditions, is simple and is high in polymerization reaction yield and atom economy, and the polythiourea which is a product is easy to separate; the polythiourea prepared by the aid of the method contains abundant N and S heteroatoms, has special photoelectric properties and has a potential unique application value in the field of biological and chemical fluorescence detection, metallic mercury ion detection and mercury ion removal; the polythiourea is high in metallic mercury ion detection sensitivity, good mercury ionremoval effects can be realized by the polythiourea, and the removal efficiency of the polythiourea is higher than 99.99% and can reach drinking water standards.
Owner:SOUTH CHINA UNIV OF TECH

Photoresist composition for negative development and pattern forming method using thereof

The present invention relates to a photoresist composition capable of negative development and a pattern forming method using the photoresist composition. The photoresist composition includes an imaging polymer and a radiation sensitive acid generator. The imaging polymer includes a first monomeric unit having a pendant acid labile moiety and a second monomeric unit containing a reactive ether moiety, an isocyanide moiety or an isocyanate moiety. The patterning forming method utilizes an organic solvent developer to selectively remove unexposed regions of a photoresist layer of the photoresist composition to form a patterned structure in the photoresist layer. The photoresist composition and the pattern forming method are especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
Owner:GLOBALFOUNDRIES INC

Phosphorescent Osmium (II) complexes and uses thereof

There is disclosed herein phosphorescent compounds, uses thereof, and devices including organic light emitting diode (OLEDs) including such compounds. Compounds of interest include: wherein A is Os or Ru The anionic chelating chromophores N{circumflex over ( )}N, which are formed by connecting one pentagonal ring structure containing at least two nitrogen atoms to a hexagonal pyridine type of fragment via a direct carbon-carbon linkage. L is a neutral donor ligand; the typical example includes carbonyl, pyridine, phosphine, arsine and isocyanide; two neutral L's can also combine to produce the so-called chelating ligand such as 2,2′-bipyridine, 1,10-phenanthroline and N-heterocyclic carbene (NHC) ligand, or bidentate phosphorous ligands such as 1,2-bis(diphenylphosphino)ethane, 1,2-bis(diphenylphosphino)benzene. L can occupy either cis or trans orientation. When L occupies the trans position, the preferred structure contains both the hexagonal fragment of NAN as well as its pentagonal fragment located at the trans position respect to their counterparts of the second NAN chromophore. When L occupies the cis position, the preferred structure consists of the pentagonal unit of N{circumflex over ( )}N chromophores residing opposite to the L. X1, X2 and X3 independently are C or N; when X2 is N, R, is omitted, when X3 is N, R2 is omitted, R1 is H, C1-C8 alkyl, C1-C8 substituted phenyl or C1-C4 perfluoroalkyl, R2 is H, F or cyano substituent, X4 is either C or N; X4 may locate at any position of the hexagonal ring, when X4 is N and R3 and R4 are not linked to X4, R3 is H, methyl or C1-C3 small alkyl, R4 is H, methyl or C1-C3 small alkyl, or R3 and R4 together form an additional conjugated unit with structure
Owner:NATIONAL TSING HUA UNIVERSITY +1

Benzoxazepin bacteriostats and synthetic method thereof

The invention relates to benzoxazepin bacteriostats and a preparation method thereof. The chemical structural formula is shown in the specification, wherein substituents R1, R2 and R3 are chloro, bromo, methyl, normal-butyl, p-chlorophenyl, methyl acetate groups, tertiary butyl or cyclohexyl, and positions, the number and conjugate positions of the substituents are not fixed. According to the synthetic method, ortho-azidobenzoic acid compounds and aryl ketoaldehyde compounds and in-situ formed isocyanide compounds are subjected toa Passerini reaction, a formed product and triphenylphosphine are subjected toa Staudinger reaction, and polysubstituted benzoxazepin heterocyclic compounds and other important heterocyclic compounds are produced through ring closing of an intramolecular aza-Wittig reaction. The key point of the invention is to provide one novel synthetic method which adopts fewer steps and has high yield to synthesize the novel benzoxazepin compounds. The compounds have better inhibitory activity on Rhizoctonia solani, Penicillium digitatum and Penicillium italicum and can be used as the bacteriostats.
Owner:CHINA THREE GORGES UNIV

Organopolysiloxane composition

Provided is an organopolysiloxane composition comprising (A) an organopolysiloxane having at least two silicon atom-bonded alkenyl groups in each molecule, (B) an organohydrogenpolysiloxane having atleast two silicon atom-bonded hydrogen atoms in each molecule, (C) a platinum catalyst and (D) a specific isocyanide compound.
Owner:SHIN ETSU CHEM CO LTD
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