The present application is applicable to the field of display technology, and provides a
thin film transistor and a preparation method thereof, and an array substrate. The
thin film transistor includes a
copper gate, an
active layer, and an insulating
layer group located between the
active layer and the
copper gate. The insulating
layer group includes at least three low-speed deposited gate insulating
layers, and the at least three low-speed deposited gate insulating
layers are sequentially covered on the
copper gate layer by layer; a medium-speed deposited gate insulating layer and / or a high-speed deposited gate insulating layer are arranged between the two low-speed deposited gate insulating
layers. A medium-speed deposited gate insulating layer and / or a high-speed deposited gate insulating layer are arranged between the two low-speed insulating layers to improve
processing efficiency. On the one hand, the denser characteristics of the lower low-speed deposited gate insulating layer are utilized to effectively block the
diffusion of metallic copper. On the other hand, the denser characteristics of the upper low-speed deposited gate insulating layer are utilized to fully contact with the
active layer, thereby ensuring the cleanliness of the interface between the insulating layer and the active layer, reducing the concave-convex phenomenon of the interface, and improving the
electron mobility.