The invention discloses a 4H-SiC
PIN diode based on gradient
doping of a P region and an I region. The 4H-SiC
PIN diode mainly solves the problem that low on-resistance and low junction
capacitance cannot be achieved in the prior art. The 4H-SiC
PIN diode comprises an n-type substrate (1), an n + layer (2), an i layer (3) and a p + layer (4) from bottom to top, a
cathode (5) is arranged on the lower portion of the substrate, an
anode (6) is arranged on the upper portion of the p + layer, a
passivation layer (7) is arranged on the upper portion of the
anode, the i layer (3) is of a multi-layer structure composed of n
layers, and all the
layers are made of 4H-SiC
semiconductor materials with linearly decreasing
doping concentration; the p + layer (4) is of a multi-layer structure composed of m
layers, and each layer is made of a 4H-SiC
semiconductor material with linearly increased
doping concentration. According to the invention, low on-resistance and low
zero bias capacitance can be realized at the same time, the response speed of the PIN
diode can be accelerated, the
cut-off frequency is improved, and the PIN
diode can be used as a
microwave diode to be applied to a
microwave amplitude limiting circuit.