Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

48results about How to "Solve the three wastes problem" patented technology

Method for recovering hydrochloric acid from HCL gas during the production process of benzene sulfochloride

ActiveCN101177242ARelieve pressureIncrease repeated cycle absorptionChlorine/hydrogen-chlorideHydrometerPositive pressure
The invention relates to a method for HCI hydrochloric acid gas recovery in the process of producing benzene sulfone chloride; based on the planar absorption apparatus, the prior positive pressure chlorosulfonation is changed into a bleed chlorosulfonation by adding a water pump and a circulation water tank at the end of tail gas, so that the pressure inside a reaction kettle and a pipeline can be reduced; the unabsorbed HCI tail gas is completely absorbed by the water pump cyclically through implementing a circulation absorption technology in the state of negative pressure. The invention has the advantages that the HCI gas which is generated in the process of sulphonation can be absorbed cyclically by adopting the negative pressure reactivity, so the smoky HCI gas in the air is removed; based on the planar absorption apparatus, the water pump and the circulation tank are added for implementing the circulation absorption under the state of negative pressure, when the absorbed concentration reaches 31% (the specific gravity is up to 1.155 which is measured by a hydrometer), the reclamation can be implemented; the invention can be used in manufacturing the products of rubber strengthening agent white black carbon so as to improve the economic benefit; the invention also can be better to solve the problem in environmental protection.
Owner:镇江惠隆化工有限公司

Acidic copper-containing etching liquid treatment method and system

The invention provides an acidic copper-containing etching solution treatment method which comprises the following steps: (1) adjusting the pH value of an acidic copper-containing etching solution to0.08-0.12, and adding an oxidant to oxidize copper in the acidic copper-containing etching solution into bivalent copper ions to obtain a mixed system A; (2) adding alkali into the mixed system A to adjust the pH value of the mixed system A to 7.5-8 so as to convert bivalent copper ions in the mixed system A into copper hydroxide precipitates; (3) dissolving the solid precipitate obtained in the step (2) with a sulfuric acid solution to obtain a mixed system B; (4) crystallizing the mixed system B to obtain solid copper sulfate; and (5) performing triple-effect evaporation desalination treatment on wastewater generated after crystallization of the mixed system B in the step (4) to obtain condensate and crystalline salt. According to the method disclosed by the invention, up-to-standard discharge treatment of the acidic copper-containing etching solution is realized, and the acidic copper-containing etching solution is converted into a copper sulfate product, so that the environmental problem is solved, and the economic benefit is achieved; in addition, the system is simple in structure and small in occupied area.
Owner:山东东顺环保科技有限公司

Synthetic method of methyl ethyl ketone peroxide with no three wastes produced

The invention provides a synthetic method of methyl ethyl ketone peroxide with no three wastes produced. According to the technical scheme, hydrogen peroxide and butanone are subjected to reaction through reverse dropping of butanone by using dimethyl phthalate as a solvent; after reaction, a hydrophilic solvent is added into the reaction product so that a finished liquid is homogenous. The synthetic method has the advantages that the technical prejudice, where mixing butanone and a solvent is before the adding of an acid catalyst and the dropping of hydrogen peroxide, in the traditional synthetic method is broken through; the method, where hydrogen peroxide is used as a base material and acidity of the hydrogen peroxide is utilized to allow autonomous catalysis, is utilized, adding otheracids is not required by the method, butanone is subjected as a raw material to reaction with dimethyl phthalate acting as a solvent, no water is required after reaction, a fixed quantity of one solvent is added to the system before a stabilizer mixture is added, and mixing well is just required; the reaction process is very stable, no three wastes are produced during the synthesis of the finishedproduct, and the finished product has very good stability and good service performance.
Owner:淄博圣马化工有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products