The invention discloses a preparation method of a nonionic Trimeric surfactant for efficient
wafer cleaning, and the specific preparation method comprises the following steps: S1, mixing
polyethylene glycol
monomethyl ether and BOC-
tertiary leucine, adding
dichloromethane as a reaction
solvent, adding a catalyst and an activator, reacting at
room temperature for 20-30 hours, and collecting a crude product BOC-
tertiary leucine ester; s2, extracting the crude product BOC-
tertiary leucine ester obtained in the step S1 with deionized water, performing rotary
evaporation drying, and performing
column chromatography purification to obtain purified BOC-tertiary leucine ester; s3, mixing the BOC-tert-leucine ester purified in the step S2 with
dichloromethane, dropwise adding
trifluoroacetic acid at 0 DEG C, gradually heating to
room temperature, and stirring to react for 2-4 hours to obtain a crude product tert-leucine ester; s4, adjusting the pH value of the crude product tert-leucine ester to 8-9 by using a NaOH
aqueous solution with the concentration of 1 mol / L, extracting, and carrying out rotary
evaporation drying to obtain tert-leucine ester; and S5, adding the tertiary leucine ester in the step S4 and trimesic
aldehyde into an
ethanol solution, mixing, carrying out
reflux reaction for 10-15 hours at 78-80 DEG C, and carrying out rotary
evaporation drying and
column chromatography purification to obtain the nonionic Trimeric surfactant.