The present application relates to the field of
polishing technology, and particularly relates to a soaking type outer circle
polishing equipment, which comprises a rack, a product fixture driving
system arranged on the rack, a driving
assembly capable of moving up and down and an auxiliary
tailstock, a quick chuck being arranged on the driving
assembly and used for clamping and driving a reverse product fixture to rotate, a lower disc moving
system being movably arranged on the rack and located below the product fixture driving
system, a
brush roller
assembly arranged on the lower disc moving system, the
brush roller assembly having a hollow cylindrical
brush roller, an inner wall of the brush roller being provided with
polishing brushes, the polishing brushes being used for accommodating and wrapping a product to be processed clamped by the product fixture driving system so as to perform wrapped polishing on an outer circle of the product to be processed, and a polishing
liquid tank arranged on the rack and located below the brush roller assembly, the polishing
liquid tank being a box structure with an upper opening and being used for accommodating polishing liquid and making the brush roller assembly and the product to be processed completely soaked in the polishing liquid.