The invention discloses a method for preparing a photoresist template by using three-beam laser interference and application of a patterned ZnO nanorod array prepared by using the method. According to the method, a large-area hexagonal-arranged circular-hole template is quickly formed through single-time exposure by virtue of a three-beam laser interference patterning technology, and the accurate regulation and control on the position, thickness, length and density of ZnO nanorods are realized through carrying out confinement hydrothermal growth on a ZnO nanorod array by using the template, so that the method has the advantages of simple system and structure, low cost, no need of a mask and a turntable, high processing speed, strong ability of regulation and control, and the like. The obtained large-area height-orderly-arranged ZnO nanorod array can be applied to multiple related fields, including light emitting diodes, ultraviolet detectors, dye-sensitized solar cells, field emission cold cathodes, stress sensors, biosensors and the like, and finally, the performance of nano-functional devices is improved, so that the ZnO nanorod array has great practical significance.