The invention discloses a novel ion cleaning technology based on plating of a hard alloy surface with ta-C film. The technology comprises the following steps that 1, impurities on the surface of a plasma substrate are ultrasonically cleaned, and charging is performed; 2, arc light enhanced argon ion bombardment is carried out in vacuum coating equipment to remove the impurities on the surface of the substrate, arc ion plating is adopted as an ionization source, the density of provided electron flow can reach 10+19/m<3>, meanwhile, a columnar coating cathode opposite to the ionization source is converted into an anode in the process, the high-density electron flow is guided to pass through a cleaned workpiece area, Ar atoms are ionized, and the Ar<+> flow is used as an ion cleaning source for the workpiece; and 3, a vacuum plating technology step is started. According to the technology, the high-density ion flow can be provided for cleaning the workpiece, and it is guaranteed that all angles of the workpiece are fully cleaned; and under the condition that low bias voltage is used, excessive bombardment action of overhigh metal ion current on the precise workpiece can be prevented, and the workpiece is prevented from being damaged.