The invention discloses a detection device and method for judging and recording the position of
silicon wafers, and belongs to the technical field of
semiconductor carrying equipment. According to the invention, slots of a
silicon wafer box are arranged in a trapezoidal manner, the upper end of the
silicon wafer box is provided with an opening, the edge of a silicon
wafer at each layer can be observed when the silicon wafers are seen from top to bottom, an
infrared distance sensor is installed above the silicon wafer box, a
signal transmitting path is along the vertical direction, an air cylinder drives the sensor to move in a straight line manner, a
signal transmitting
diode of the sensor transmits signals to the silicon wafers through the opening at the upper end of the silicon wafer box, the signals are reflected by the edge of the silicon wafer at each layer and received by a receiving
diode, signals reflected by the silicon wafers located at different
layers are different, the reflected signals are transmitted to an industrial control computer through an acquisition card, the industrial control computer performs analysis and classification on the acquired signals through
software, and a
manipulator performs process operations according to data of the industrial control computer. The detection device and method provide an experimental basis for recognition for the position of the silicon wafers and the operation reliability of the
manipulator.