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94results about How to "Inhibition Manufacturing Method" patented technology

Semiconductor device manufacturing method, and adhesive film used in semiconductor device manufacturing method

The purpose of the present invention is to provide a semiconductor device manufacturing method, whereby cutting reliability of an adhesive film can be improved and debris contamination due to the adhesive film can be suppressed. Provided is a semiconductor device manufacturing method which is provided with: a step wherein, after forming a groove (4S) on the front surface of a semiconductor wafer (4), a protective adhesive film (44) is adhered, the rear surface of the semiconductor wafer is ground, and the groove is exposed from the rear surface; a step wherein, after adhering the adhesive film on the rear surface of the semiconductor wafer, the protective adhesive film is peeled; and a step wherein a laser beam having a wavelength of 355 nm is radiated along the groove exposed from the adhesive film, and the adhesive film is cut. The adhesive film has (a) a light absorption coefficient of 40 cm-1 or more at a wavelength of 355 nm, (b) a tensile storage elastic modulus of 0.5-20 MPa at 50 DEG C, and (c) a tensile storage elastic modulus of 0.3-7 MPa at 120 DEG C, or a melt viscosity of 2,000 Pa.s or more at 120 DEG C.
Owner:NITTO DENKO CORP

Heat radiation plate, semiconductor device and manufacturing method of heat radiation plate

The invention provides a heat radiation plate which has an excellent heat radiation property and can prevent the heat stress from acting on heating bodies such as a semiconductor element under a cold and hot circulating load, a semiconductor device utilizing the heat radiation plate and a manufacturing method of the heat radiation plate. The heat radiation plate (30) is used for radiating heat produced by a heating body (3) which is carried by the heat radiation plate (30); and the heat radiation plate (30) is characterized by having a plate main body (31) and metal surface layers (32 and 33), wherein the plate main body (31) is formed by filling a metal-based composite material of a metal material into a carbon part, the metal surface layers (32 and 33) are formed on at least one side surface of the plate main body (31), the metal-based composite material forming the plate main body is formed by impregnating a molten metal material into the carbon part, and the metal surface layers (32 and 33) are formed through collision of metal powder onto the surfaces of the plate main body (31).
Owner:MITSUBISHI MATERIALS CORP

Method of manufacturing negative electrode for solid-state battery, method of manufacturing solid-state battery, and negative electrode slurry

The invention relates to a method of manufacturing a negative electrode for a solid-state battery, a method of manufacturing a solid-state battery, and negative electrode slurry. Provided is a method of manufacturing a negative electrode for a solid-state battery, the method including: a step of mixing a negative electrode active material, a sulfide solid electrolyte, a binder, and a solvent with each other to prepare a negative electrode slurry; a step of applying the prepared negative electrode slurry to a surface of a solid electrolyte layer of the solid-state battery or a substrate of the negative electrode; and a step of drying the applied negative electrode slurry. In this method, the solvent is butyl butyrate, and the binder is a copolymer containing a vinylidene fluoride (VDF) monomer unit and a hexafluoropropylene (HFP) monomer unit, in which a molar ratio of the HFP monomer unit to a total amount of the VDF monomer unit and the HFP monomer unit is 10% to 25%.
Owner:TOYOTA JIDOSHA KK

Metal chloride gas generator, hydride vapor phase epitaxy growth apparatus, and method for fabricating a nitride semiconductor template

The invention provides a metal chloride gas generator, a hydride vapor phase epitaxy growth apparatus, and a nitride semiconductor template, wherein undesirable impurities are prevented from mixing with the raw materials of the nitride semiconductor template. An hydride vapor phase epitaxy (HVPE) growth apparatus comprises a Ga tank and an A1 tank both arranged at a raw material section on an upstream side, and a growing section reacting furnace provided with a growth sapphire substrate. A raw material section heater and a heater each of which heats an inside of the reactor, an upstream end comprising a gas inlet, and a gas inlet pipe arranged to extend from the upstream end via the receiving section to the growing section, for introducing a chloride gas from the upstream end to supply the chloride gas to the receiving section and supplying a metal chloride gas produced by a reaction between the chloride gas and the metal in the receiving section to the growing section. The gas inlet pipe includes a suppressing section for suppressing an optical wave guiding phenomenon which waveguides a radiant heat from the growing section heater or the growing section.
Owner:SUMITOMO CHEM CO LTD

Method for manufacturing thermoelectric converter

An insulating substrate (10) in which a plurality of via holes (11, 12) that penetrate said substrate in the thickness direction thereof are filled with a conductive paste (41, 51) is prepared. Said conductive paste (41, 51) is obtained by adding an organic solvent to an alloy powder in which a plurality of metal atoms maintain a prescribed crystal structure. Then, while the insulating substrate (10) is being heated, pressure is applied from the top surface (10a) and the bottom surface (10b) thereof. The conductive paste (41, 51) is thus subjected to solid-state sintering, forming interlayer connection members (40, 50). Next, a top-surface protection member (20) is placed on the top surface (10a) of the insulating substrate (10) and a bottom-surface protection member (30) is placed on the bottom surface (10b) of the insulating substrate (10), forming a laminate (80). Said laminate (80) is then fused into a single unit by the application of simultaneous heat and pressure, albeit at a lower temperature and with less pressure than were used in the step that formed the interlayer connection members (40, 50).
Owner:DENSO CORP +1

Polyol composition for rigid polyurethane foam and process for producing rigid polyurethane foam

The invention provides a polyurethane rigid foam polyatomic alcohol compound which uses HFC-245fa as a foaming agent and simultaneously inhibits vapor pressure of the compound and a manufacturing method for polyurethane rigid foam. In the polyurethane rigid foam polyatomic alcohol compound, compositions of the foaming agents are 1,1,1,3,3-pentafluoropropane (HFC-245fa) and the foaming agents contain acetic acid diethylene glycol monoethylether ester. The polyatomic alcohol compound of the invention comprises a polyatomic alcohol compound provided with tertiary amino groups, and weight percent of nitrogen based on the amino groups is 0.5 to 9 percent of the polyatomic alcohol compound. HFC-365mfc or HFE-254pc is preferably selected as composition of the foaming agent.
Owner:SEKISUI SOFLAN WIZ CO LTD

Method for producing device

An exposure apparatus, wherein exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a pattern image caused by any bubble in the liquid. The exposure apparatus includes a liquid supply unit 1 which fills at least a part of the space between the projection optical system and the substrate with a liquid 50 , and exposes the substrate by projecting an image of a pattern onto the substrate via the projection optical system. The liquid supply unit 1 includes a degassing unit 21 which suppresses the generation of the bubble in the liquid 50.
Owner:NIKON CORP

Polyol composition for rigid polyurethane foam and process for producing rigid polyurethane foam

The invention provides a polyurethane rigid foam polyatomic alcohol compound which uses HFC-245fa as a foaming agent and simultaneously inhibits vapor pressure of the compound and a manufacturing method for polyurethane rigid foam. In the polyurethane rigid foam polyatomic alcohol compound, compositions of the foaming agents are 1,1,1,3,3-pentafluoropropane (HFC-245fa) and the foaming agents contain acetic acid diethylene glycol monoethylether ester. The polyatomic alcohol compound of the invention comprises a polyatomic alcohol compound provided with tertiary amino groups, and weight percent of nitrogen based on the amino groups is 0.5 to 9 percent of the polyatomic alcohol compound. HFC-365mfc or HFE-254pc is preferably selected as composition of the foaming agent.
Owner:SEKISUI SOFLAN WIZ CO LTD

Method for manufacturing crude melt of glass raw materials and method for manufacturing optical glass

A method for manufacturing a crude melt of glass raw materials and a method for manufacturing optical glass by using the crude melt of glass raw materials, wherein the crude melt of glass raw materials can suppress coloring of the optical glass manufactured by using the crude melt of glass raw materials. The method of manufacturing the crude melt of the glass raw materials at least comprises: feeding the glass raw materials from the input port (22) of a material processing member (20) to the raw material feeding process in the material processing member (20), and enabling the glass raw materials fed to the material processing member (20) to move from the inlet(22) to the outlet (24), and performing a process of heating for melting, and a solidification process for solidifying the crude melt of the glass raw materials falling from the flow outlet (24) through cooling, to manufacture the crude melt of glass raw materials. Further, in the process of enabling the glass raw materials fed to the material processing member (20) to move from the inlet(22) to the outlet (24) side, the glass raw material is temporarily retained in the material processing member (20).
Owner:HOYA CORP

Modified polymer latex production method

A production method of a modified polymer latex is provided which involves adding a carboxy group-containing compound, an anionic surfactant with a weight average molecular weight less than 500 and ananionic surfactant with a weight average molecular weight greater than or equal to 500 to a polyisoprene latex, and reacting the carboxy group-containing compound with the polyisoprene in the presence of the anionic surfactant with a weight average molecular weight less than 500 and the anionic surfactant with a weight average molecular weight greater than or equal to 500.
Owner:ZEON CORP

Method for producing (meth)acrylate and (meth)acrylate composition

Disclosed is a simple method for producing a (meth)acrylate which enables to obtain a (meth)acrylate improved in storage stability and thermal stability. Also disclosed is a (meth)acrylate composition. The production method comprises an esterification step wherein a (meth)acrylic acid and an alcohol having an oxyalkylene group are dehydrated with an organic sulfonic acid catalyst in an organic solvent, thereby obtaining a (meth)acrylate; and an adjustment step wherein a compound A represented by the formula (1) below is controlled to be 0-100 ppm in the thus-obtained (meth)acrylate. The production method also comprises an addition step wherein a specific processing agent is added into an organic reaction liquid which contains not less than 1 ppm of the compound A relative to the (meth)acrylate obtained through the esterification step and a step for performing neutralization and water rinsing. (1) [In the formula (1), R1 represents an alkyl group or an aryl group; R2 represents an alkylene group; and R3 represents a hydrogen atom or a methyl group.
Owner:TOAGOSEI CO LTD

Color filter manufacturing method

The invention relates to a method of manufacturing color filter capable of reducing facet fault of the coating film and restraining the occurrence of the fault; wherein, the method comprises: first filtering procedure of filtering the light-sensitive resin composition at the filtering speed of above 0.1 ml / min.cm2 and below 1.0 ml / min.cm2 through the first filter; and a second filtering procedure of further filtering the light-sensitive resin composition at the filtering speed of above 30 ml / min.cm2 and below 200 ml / min.cm2 through the second filter after the first filtering procedure; and a coating procedure of coating the light-sensitive resin composition filtered by the second filtering procedure on the substrate.
Owner:FUJIFILM CORP

Inductor and manufacturing method thereof

The invention provides an inductor and a method for manufacturing the inductor, which can suppress the occurrence of short circuit failure between the external terminal and a part of a coil except forthe part connected with the external terminal. The inductor includes a body including a magnetic body having a coil embedded therein and containing magnetic powder. The coil has a winding portion inwhich a conductive wire is wound around and has a pair of lead portions taken out from the winding portion. The inductor also includes a pair of outer electrodes formed on the body. In the inductor, each of the lead portions is exposed from at least one side surface of the magnetic body and is coupled to a corresponding outer electrode. In addition, with respect to a position at which each of thelead portions is exposed from the at least one side surface of the magnetic body, a magnetic powder content in a region closer to one of the principal surfaces is higher than a magnetic powder contentin a region closer to the other one of the principal surfaces.
Owner:MURATA MFG CO LTD
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