The invention discloses an LED epitaxial structure. The LED epitaxial structure comprises a substrate, a buffer layer, a u type gallium nitride layer, an n type gallium nitride layer, an electron barrier layer, a multiple-quantum well layer and a p type gallium nitride layer, wherein the substrate, the buffer layer, the u type gallium nitride layer, the n type gallium nitride layer, the electron barrier layer, the multiple-quantum well layer and the p type gallium nitride layer are arranged in a stacked mode in sequence from bottom to top. According to the LED epitaxial structure, due to the fact that the electron barrier layer is arranged between the n type gallium nitride layer and the multiple-quantum well layer, electron injection is effectively stopped, electron leakage is reduced, hole injection is increased, and thus the luminous efficiency is improved; due to the fact that an n type AlGaN / GaN superlattice structure is inserted in the space between an n type GaN layer and an active area to replace the AlGaNEBL in a traditional structure, electron injection is effectively stopped, electron leakage is reduced, hole injection is increased, and thus the luminous efficiency is further improved. The LED epitaxial structure can be widely applied to the LED field.