4 results about "Water assisted" patented technology

The utility model provides a waterproof structure for construction of an ultra-deep foundation pit in an urban updated industrial factory building. The waterproof structure for construction of the ultra-deep foundation pit in the urban updated industrial factory building comprises a secant pile body, and a steel pipe pile support is arranged outside the secant pile body; a tube well is arranged on the outer side of the steel pipe pile support. According to the technical scheme, preliminary waterproofing is achieved through tight meshing of the secant pile body; the waterproof performance is improved through the reinforcing effect of the steel pipe pile support; the water level in the foundation pit and the leakage risk are reduced under the assistance of dewatering of the tube well; and finally, construction of multiple waterproof barriers is achieved, and construction safety and foundation pit stability are ensured.

This invention discloses a contamination-free transfer method for MoS2 thin films on wide-bandgap semiconductors, comprising: spin-coating a PMMA solution onto the surface of a MoS2 / SiC substrate and curing it to form a PMMA / MoS2 / SiC composite substrate, and drawing an opening at its edge; tilting the composite substrate with the opening into deionized water, allowing the deionized water to enter between the PMMA / MoS2 layer and the SiC layer through the opening, and using the surface tension of the water to completely separate the PMMA / MoS2 layer from the SiC layer; transferring the separated PMMA / MoS2 layer onto a target substrate; and performing resist removal, cleaning, and drying on the transferred sample to complete the transfer of the MoS2 thin film. This method abandons the traditional etching process, utilizes the hydrophilic properties of SiC to achieve peeling through water-assisted interfacial energy control, effectively avoiding substrate structure damage and irreversible damage, and improving the substrate's reusability and process compatibility.

The application discloses a high-reliability transfer method of nanomaterial based on water assistance, which comprises the following steps: preparing polydimethylsiloxane (PDMS) with micro-nano structures, and storing a small amount of water molecules in the surface micro-nano structures of the PDMS; and heating to make the water in the micro-nano structures evaporate rapidly, so as to promote the separation of the PDMS and the material to be transferred, and the material to be transferred is not prone to wrinkling, the success rate of dry transfer of nanomaterial and large-area thin film material is improved, and the application is suitable for the manufacturing field of constructing heterojunction and two-dimensional semiconductor devices by dry transfer.

This invention belongs to the field of low-alloy high-strength structural steel production technology, specifically relating to a production method for ultra-long low-alloy steel plates with a thickness of 12mm ≤ 20mm. It includes: setting the initial cooling temperature for each stage, fine-tuning the roller speed and acceleration in tandem, precisely configuring the water volume and ratio in segments, precisely controlling the red-heat temperature within a narrow range, and using differentiated masking at the beginning and end combined with water spraying in the middle. Compared to existing technologies, this invention significantly improves cooling uniformity, resulting in more uniform and stable microstructure and properties; it thoroughly improves plate shape defects and significantly reduces residual stress; it achieves extremely high precision in controlling the red-heat temperature, enhancing performance stability; and it is suitable for mass production of long, reduced-length plates, improving production efficiency.