The present invention provides a kind of plasmaprocessing device, the purpose is to control the power of the power with the bandwidth realized by multiple carriers after pulse modulation with high precision.The device includes the power supply unit that can generate the power with bandwidth, the power generated by power supply unit is implemented pulse modulation so that it has high level power and low level power, and, the pulse on time determined by setting pulse frequency and setting duty cycle has the power variation period of the power with bandwidth is long.
The application discloses a kind of radio frequencysignal source output power control method, the method includes: the output power range of standard radio frequencysignal source and the numerical control attenuation range of numerical control attenuator are divided to obtain multiple control regions, the boundary point of each control region corresponds an output power, a frequency and a numerical control attenuation quantity;Each control region is constructed standard corresponding relationship based on the numerical control attenuation quantity corresponding to the voltage control attenuator;Based on the standard corresponding relationship, target frequency and target power, control the radio frequencysignal source to be controlled, can accurately control the power required by radio frequency signal source output, avoid the larger error of output power.