The invention provides an LED vertical
chip structure and a manufacturing method thereof. The method comprises the following steps of S1, providing a
sapphire substrate and growing an unintentionally-doped GaN layer, an N-type GaN layer, a multi-
quantum well layer and a P-type GaN layer successively on the substrate; S2, forming several discrete P electrodes; S3, forming several discrete first bonding
metal layers which cover the P electrodes; and providing a bonding substrate and forming several discrete second bonding
metal layers on a surface of the bonding substrate; S4, carrying out alignment bonding on the first bonding
metal layers and the second bonding metal layers; S5, removing the
sapphire substrate; S6, removing the unintentionally-doped GaN layer, and using a dry method
etching technology to form a
cutting channel, wherein the
cutting channel avoids an area where the bonding metal layers are located; and S7, forming an N
electrode. In the invention, a graphical bonding structure (formed by several discrete bonding metal layers) is adopted so that a metal splashing problem generated when ICP etches the
cutting channel is effectively avoided; and a
chip electric leakage risk is reduced so that
chip reliability is effectively increased.