The utility model provides a
wafer lifting, clamping and rotating cleaning device, and relates to the technical field of
wafer cleaning, the
wafer lifting, clamping and rotating cleaning device comprises a cleaning tank and a pre-cleaning mechanism, one side of the inner wall of the cleaning tank is provided with a transmission track, one side of the outer wall of the cleaning tank is provided with a feeding port, one side of the inner wall of the cleaning tank is provided with a
megasonic cleaning machine, and the other side of the inner wall of the cleaning tank is provided with a feeding port. The pre-washing mechanism comprises a fixed aluminum plate and two
servo motors, and speed reducers are arranged on the tops of the two
servo motors. In the utility model, under the action of the two lifting cylinders and the four vertical guide rails, the two lifting cylinders and the four vertical guide rails drive the two fixed plates, the two movable plates, the four driving rotating shafts and the four rotating shaft sleeves to move upwards, so that the rotating shaft clamping sleeves are ensured to be on a track transmission plane and then extend out through the two clamping centering cylinders; the wafer is driven to rotate to drive the rotating shaft and the related components to move inwards together and stop after extending to the limiting positions of the first limiting screw and the second limiting screw, the air cylinder is magnetically opened and fed back in place, and at the moment, wafer clamping is completed.