The invention discloses a
femtosecond laser preparation
system and method for a
silicon photonic crystal waveguide device. The
femtosecond laser preparation
system for the
silicon photonic crystal waveguide device comprises a
femtosecond laser, a multistage half-wave plate, a polarization splitting
prism, a first reflecting mirror, a
spatial light modulator, a first lens, a second reflecting mirror, a third reflecting mirror, a second lens, an electric flip mirror, a fourth reflecting mirror, a high-power objective lens, a three-dimensional
processing platform, a third lens, a
CCD camera and acomputer. Lasers output by the femtosecond laser pass through the multistage half-wave plate and the polarization splitting
prism and pass through the reflecting mirrors to
shoot into the
spatial light modulator. A
processing scheme is generated to a hologram by the computer, and the hologram is loaded to the
spatial light modulator. After modulation is completed, light beams pass through the first lens, the second reflecting mirror, the third reflecting mirror, the second lens and the fourth reflecting mirror, and then are focused on a
silicon substrate through the high-power objective lens,the movement of the three-dimensional
processing platform is controlled by a program input into the computer to complete the processing task. The femtosecond laser preparation
system and method for the silicon
photonic crystal waveguide device has simple processing steps, high
processing accuracy, high processing speed and low
processing cost.