The invention provides a GaN-based laser diode structure and a manufacturing method. The GaN-based laser diode structure comprises an N electrode, an n-type GaN substrate, an N covering layer, an N waveguide layer, a light-emitting active layer, a P waveguide layer, an electron blocking layer and a passivation layer which are sequentially arranged in a stacked mode. A ridge strip is arranged on the upper surface of the P-type electron barrier layer and comprises a P covering layer, and a P contact layer and a P contact electrode layer which are sequentially stacked on the P covering layer; the passivation layer comprises a first passivation layer and a second passivation layer which are arranged in a stacked mode, the first passivation layer is arranged on the upper surface of the P-type electron blocking layer and located on the two sides of the ridge strip, a groove is formed in the second passivation layer, a first metal layer is arranged on the upper surface of the second passivation layer and on the ridge strip, the first metal layer is provided with a protruding part corresponding to the groove, and a second metal layer is arranged on the protruding part. And a P electrode is arranged on the upper surface of the first metal layer. The stress of the electrode structure is reduced, the adhesive force between the metal electrode and the passivation layer is improved, a thick metal electrode can be formed, the packaging requirement is reduced, the heat dissipation performance is improved, and application is expanded.