The present invention discloses an electrostatic chucking device having a laminated structure which is formed by sequentially laminating a first
insulation layer, an
electrode layer and a second
insulation layer on
metal substrate, wherein the first
insulation layer and the second insulation layer are constituted of
polyimide films, and at least the adhesion between the
metal substrate and the first insulation layer, and, preferably, further, the adhesions including the adhesion between the first insulation layer and the
electrode layer and the adhesion between the
electrode layer and the second insulation layer are performed by using
thermoplastic polyimide-based
adhesive films having a film thickness of 5 to 50 mum. Further, to manufacture the electrostatic chucking devices having such a constitution, the present invention also discloses an electrostatic chucking device manufacturing method which performs the low-temperature compression bonding
processing under pressure at a temperature of 100 to 250° C. between the
metal substrate and the first insulation layer, between the first insulation layer and the electrode layer, and between the electrode layer and the second insulation layer using thermoplasticpolyimide-based adhesion films. According to the present invention, the electrostatic chucking device can exhibit the excellent attraction performance over a long period while ensuring the excellent durability and the excellent
heat resistance. Further, the method can manufacture the electrostatic chucking devices which do not contaminate a periphery of the device and a
wafer.