The invention discloses a batch preparation method of a suspended 
nanowire manipulator. The method comprises the following steps: preparing a 
nanowire array growing on the edge of a slope step definedby photoetching based on an IPSLS growth mode, then, spin-
coating a layer of 
oxygen resin 
colloid on the substrate on which the 
silicon nanowires grow; carrying out photoetching pattern operation, removing an 
amorphous silicon dielectric layer on the surface of the substrate by wet 
etching, suspending an 
epoxy resin 
colloid thin film adhered to a 
nanowire array on the surface of a solution, fullyreplacing the 
epoxy resin 
colloid thin film with 
ethanol, and carrying out a 
drying technology to prepare the self-assembled suspended nanowire 
manipulator array. According to the invention, the 
nanowire array is transferred to the photoetched self-supporting substrate by using a transfer technology and a 
critical point drying technology; the influence of solution 
surface tension is eliminated, the original appearance of the nanowire 
manipulator is kept, finally, the operable suspended nanowire manipulator array is obtained, and the method can be widely applied to various fields of nano robots, biomedical 
cell detection, biosensors and the like.