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48 results about "Delafossite" patented technology

Delafossite is a copper iron oxide mineral with formula CuFeO₂ or Cu¹⁺Fe³⁺O₂. It is a member of the delafossite mineral group, which has the general formula ABO₂, a group characterized by sheets of linearly coordinated A cations stacked between edge-shared octahedral layers (BO₆). Delafossite, along with other minerals of the ABO₂ group, is known for its wide range of electrical properties, its conductivity varying from insulating to metallic. Delafossite is usually a secondary mineral that crystallizes in association with oxidized copper and rarely occurs as a primary mineral.

P-type oxide semiconductor thin-film transistor and preparing method thereof

The invention discloses a P-type oxide semiconductor thin-film transistor and a preparing method thereof. The thin-film transistor comprises the components of a heavily doped silicon substrate which is used as a gate electrode; an insulating layer which is an insulating oxide film and is arranged on the gate electrode; an active layer which is a P-type delafossite-structured oxide film and is arranged on the insulating layer; a source electrode and a drain electrode which are Cu films and are arranged on the active layer. The P-type delafossite-structured oxide film is made of CuAlO2, CuInO2 or CuGaO2. The P-type delafossite-structured oxide film which is used as the active layer represents a stable P-type semiconductor characteristic, thereby realizing large valence band maximum frequency bandwidth and high hole mobility. The p-type oxide semiconductor thin-film transistor has a simple structure and furthermore the preparing process of the p-type oxide semiconductor thin-film transistor is compatible with microelectronic technology. Furthermore the p-type oxide semiconductor thin-film transistor has advantages of high chemical stability and excellent electrical property. The p-type oxide semiconductor thin-film transistor has a wide application prospect in organic light-emitting diode displaying, complementary oxide semiconductor electronic circuits and transparent electronic circuits.
Owner:HENAN UNIVERSITY

Preparation method of delafossite type copper aluminum oxide infrared transparent conductive film

The invention relates to a preparation method of a nanoscale infrared transparent conductive film, in particular to a preparation method of an infrared transparent conductive film which is used in the infrared window and is transparent and conductive. The preparation method selects sapphire or silicon (111) as a substrate material for thin film growth; the preparation method of the thin film mainly adopts a high-vacuum magnetron sputtering technology; a co-target sputtering method is provided, wherein the target materials are respectively a Cu2O target and a Al2O3 target, or a Cu target and an Al target; and the obtained thin film is annealed in nitrogen at 500-600 DEG C for 3-5h to complete a preliminary chemical reaction, and then the thin film is annealed at a high temperature of 1000-1200 DEG C for 3-5h to completely react and crystallize. According to the preparation method, by adjusting the power of the two targets to control the compositions of the thin film, the problem of the one-target sputtering method that the ratio of Cu to Al can not be accurately controlled to be 1:1 so as to generate various oxides is solved; and the two-step annealing mode is adopted to avoid the loss of the related copper oxides caused by direct high-temperature annealing, thus the quality of the thin film can be increased.
Owner:JILIN UNIV

Preparation method of CuFeO2 microcrystalline material of high-purity 3R delafossite structure

The invention discloses a preparation method of a CuFeO2 microcrystalline material of a high-purity 3R delafossite structure. The preparation method comprises the steps: adding Cu(NO3)2.3H2O and Fe(NO3)3.9H2O into deionized water, performing magnetic stirring for dissolution so as to obtain a mixed solution, adding a NaOH solution dropwise to the mixed solution, then performing ultrasonic stirringand magnetic stirring sequentially, then adding n-propionaldehyde dropwise, keeping magnetic stirring until formation of a colloidal suspension, adding the colloidal suspension to a reaction vessel,performing a reaction at 100-180 DEG C for 6-24 h, cooling the kettle body naturally to room temperature after completion of the reaction, opening the kettle body, taking out the reaction product, washing the reaction product, and performing drying so as to obtain the CuFeO2 microcrystalline material of a high-purity 3R delafossite structure. The preparation method has simple operation and easilycontrollable process parameters, no pollution, high yield, completely developed grains and uniformly distributed particle size are achieved, the product can be widely applied to photocatalytic decomposition of water for hydrogen production, degradation of pollutants, photocatalytic reduction of CO2, transparent conductive oxides and ferromagnetic materials and other materials and devices with photoelectric conversion functions.
Owner:KUNMING UNIV OF SCI & TECH

Method for quickly preparing single-phase delafossite structure CuFeO2 microcrystalline material

InactiveCN110436526AAvoid accuracyTo avoid deviations from its actual valueIron compoundsFilling rateParticle-size distribution
The invention discloses a method for quickly preparing a single-phase delafossite structure CuFeO2 microcrystalline material. The method comprises the steps that Cu(NO3)<2>.3H2O and Fe(NO3)<3>.9H2O are added into deionized water according to the mole ratio of 1:1, magnetic stirring for dissolving is conducted, and thus a mixed solution is obtained; a NaOH solution is dropwise added into the mixedsolution drop by drop, and then ultrasonic stirring and magnetic stirring are conducted in sequence; n-propanal is added into the solution dropwise, and then magnetic stirring is continued till colloidal suspension is formed; and the colloidal suspension is added into a microwave digestion tank, the filling rate of the colloidal suspension is 10-35%, microwave heating is conducted after sealing, after reaction is completed, a reaction product is naturally cooled to the room temperature, the microwave digestion tank is opened to take the reaction product out, and the reaction product is washedand dried to obtain the single-phase delafossite structure CuFeO2 microcrystalline material. According to the method, the reaction time is extremely short, energy consumption is less, operation is easy, technological parameters are easy to control, pollution is avoided, the yield is high, grains are developed completely, particle size distribution is even, and the single-phase delafossite structure CuFeO2 microcrystalline material can be widely applied to the fields of photocatalysis, photovoltaics, transparent conductive oxide, ferroelectric and the like.
Owner:KUNMING UNIV OF SCI & TECH

Heterojunction semiconductor structure based on gallium oxide and semiconductor device

The invention discloses a heterojunction semiconductor structure based on gallium oxide, which structurally comprises at least one gallium oxide base layer and at least one delafossite layer, whereinthe gallium oxide base layer is provided with a plurality of contact surfaces; and the delafossite layer and the gallium oxide base layer form a heterojunction structure through the contact surfaces.By means of the structure, the matching of the forbidden bandwidth, the matching of the conduction band and the matching of the valence band are achieved, and the current transport capacity of the structure is improved; besides, the heterogeneous PN junction structure also realizes the matching of a crystal structure, avoids the formation of a large number of dislocation defects on the contact surface of the heterogeneous PN junction, and improves the forward transport performance of the PN junction, the on-resistance of a device adopting the structure and the performance stability of the device; and finally, the preparation process of the delafossite material is simple, the delafossite material can be directly formed by adopting a similar sol-gel method or a hydrothermal synthesis method,the preparation cost and process of the structure are greatly reduced, and large-scale industrial production is easy to realize.
Owner:合肥中科微电子创新中心有限公司
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