The invention relates to a cold isostatic pressing forming preparation method of a tungsten oxide-based ceramic target material, which comprises the following steps of raw material preparation: takingprimary mixed powder containing high-purity tungsten oxide and doping source powder, enabling the doping source to be selected from at least three of Ti, Mo, V, Al, Li and Zr, enabling the purity ofthe mixed powder to be greater than 99.95%, enabling the average particle size to be 500nm to 1800nm, and enabling the D50 particle size to be 200-750nm, wherein the quantitative relation of M1, M2, M3, M4 and M5 conforms to the formula as described in the specification, conducting spray drying, powder filling and compaction, pressing, biscuit degumming and sintering, taking out the sintered blankafter heat preservation, and conducting or not conducting machining according to needs. The cold isostatic pressing forming preparation method can be used for preparing the tungsten oxide-based ceramic target material with good conductivity, higher purity, fine grain size and high density.