38results about How to "Simple polishing process" patented technology

A polisher has an offset axis and a friction cam useful in a method of polishing that comprises a more random, elongated polishing pattern than known orbital polishers and is capable of portable use using a 9 volt battery. The method is capable of using lower contact pressures between fiber ends and a polishing surface and higher rates of rotation of the drive mechanism, reducing the polishing time for preparing fiber ends for applications. The polishing pattern changes when pressure is applied between a fiber end and the polishing surface. The fiber end provides one intermittent axis of rotation and the friction cam provides another intermittent axis of rotation.

The invention discloses a polishing solution used for chemico-mechanical polishing, which comprises polishing solution for rough polishing and polishing solution for fine polishing, wherein the polishing solution for rough polishing comprises 5-10wt% of nano grinding material, 1.5-3wt% of oxidant, 0.01wt% of surface active agent, pH regulator and the balance of deionized water, and has the particle size of 60-100nm and the pH value of 9.5; the polishing solution for fine polishing comprises 1-5wt% of nano grinding material, 0.5-1.5wt% of oxidant, 0.01wt% of surface active agent, pH regulator and the balance of deionized water, and has the particle size of 15-30nm and the pH value of 9.5; and the invention also relates to a method for carrying out chemico-mechanical polishing on a cadmium sulfide (CdS) wafer by applying the polishing solution, which comprises the steps of: carrying out rough polishing on the CdS wafer to be polished by the polishing solution for rough polishing, and then carrying out fine polishing on the CdS wafer by the polishing solution for fine polishing after rough polishing, wherein during the rough polishing and the fine polishing, the polishing pressure is 60-120g/cm<2>, the rotating speed is 60-100r/min, and the flow rate of the corresponding polishing solution is 50-200ml/min. The invention is simple in polishing technology, easy in operation and less in damage caused by the used polishing solution.

A method of manufacturing a fiber optic ferrule device, comprising steps of: providing a ferrule assembly; inserting a fiber into a fiber bore of the ferrule assembly until the fiber protrudes a predetermined distance from a front end surface of the ferrule assembly; and filling an adhesive into the ferrule assembly, so that the adhesive flows into the fiber bore and holds the fiber in place in the fiber bore after the adhesive is cured. The fiber is easily and smoothly inserted through the ferrule assembly, and the risk that the fiber is damaged by the adhesive is avoided. Also, the fiber protruding from the front end of the ferrule assembly is not adhered with any adhesive.

The invention discloses a non-wax polishing adsorption pad and a manufacturing method thereof. The non-wax polishing adsorption pad comprises a grinding board, a first adhesive layer, an adsorption skin, a second adhesive layer, a supporting board and a gum layer, wherein the first adhesive layer and the second adhesive layer are each made of a hot melt adhesive film. The method includes the following production steps that firstly, the grinding board, the first adhesive layer, the second adhesive layer, the adsorption skin, the supporting board and the gum layer are cut to be of certain dimensions; secondly, the grinding board and the first adhesive layer are bonded to form a grinding layer composite board; thirdly, the first plane of the supporting board and the second adhesive layer are bonded, and the second plane of the supporting board and the gum layer are bonded, so that a supporting layer composite board is obtained; fourthly, a grinding layer processed board is obtained by processing and cutting the grinding layer composite board; fifthly, the supporting layer composite board and the adsorption skin are bonded to form an adsorption skin composite board; sixthly, the adsorption skin composite board and the grinding layer processed board are bonded to form an adsorption pad semi-finished product; and seventhly, edge cutting is carried out, specifically, the non-wax polishing adsorption pad is obtained by removing redundant portions.

The invention discloses a prism polishing device. The device comprises a machine frame, a buffing wheel connecting the machine frame, a wheel drive device connecting the buffing wheel and driving the buffing wheel to rotate, nozzles for ejecting magnetorheological fluid, a workbench arranged on the machine frame, a lifting fixture arranged on the workbench and used for clamping the prism and a loop structure of magnetorheological fluid; the buffing wheel is arranged on the upper side of the lifting fixture, a recovery port of polishing liquid is arranged on the workbench, the recovery port of polishing liquid is connected with a collector of the loop structure of magnetorheological fluid, an outlet of the loop structure of magnetorheological fluid is connected with nozzles, the nozzles face towards the lifting fixture, the location of the nozzles is in coordination with the location of the buffing wheel and is in coordination with the location of the lifting fixture; the buffing wheel comprises a wheel body and a magnetic field generator sticking into the wheel body. By adopting the said structure, the prism polishing device is high in polishing efficiency and is suitable to be applied to industrial production; the manufacturing cost is low, and the requirement on experience or skill of the operating personnel for controlling the detection and the precision is low.

The invention provides an ultralow temperature polishing machine which comprises a metal shell, an electromotor, a polishing disk with a taper sleeve, a polishing pad, a test sample fixing device and a top cover with a thermal insulating layer; the ultralow temperature polishing machine is characterized in that the ultralow temperature polishing machine is additionally provided with a draught fan, an electric heater, a temperature sensor, a liquid level sensor and a liquid nitrogen metal container with the thermal insulating layer, wherein the liquid nitrogen metal container is arranged on one side wall of the metal shell; the liquid level sensor is arranged inside the liquid nitrogen metal container; the temperature sensor and the electric heater are arranged on the side wall of the metal shell which is arranged in a working area; a window is arranged on the side wall of the metal shell in the working area which is close to the liquid nitrogen metal container; another window which corresponds to the window on the side wall of the metal shell is also arranged on the thermal insulating layer of the liquid nitrogen metal container; the draught fan is arranged on the outer wall of the liquid nitrogen metal container in space formed by the two windows; and a netted protective guard is arranged at the periphery of the draught fan. The ultralow temperature polishing machine has the advantages that the operation is safe, the polishing degree of materials is high, meanwhile, the scratch resistance capacity of the surface of the materials is increased and the subsurface damage is reduced.

The invention discloses a manufacturing method of a back surface polishing crystalline silicon solar battery. The method comprises the following concrete steps: performing texturing and cleaning before diffusion; performing the diffusion; performing wet etching and PSG removal; plating a front surface with a silicon nitride film; plating a back surface with an alundum (Al2O3) membrane; performing laser groove etching; and performing screen printing and sintering. The method is characterized in that before the texturing and the cleaning before the diffusion, a back surface membrane plating process is also arranged, i.e., the back surface of an initial P-type silicon chip is plated with the silicon nitride film with a mask effect according to a conventional method. Compared to a conventional process, the method has the following advantages: only the back surface membrane plating process is added before a texturing and pre-diffusion cleaning process begins, at the same time, an individual back surface polishing process of the P-type silicon chip is omitted, back-surface polishing of the P-type silicon chip can also be realized, damage caused by the individual back surface polishing process to a solar battery N-type diffusion layer is avoided, and therefore, the photoelectric conversion efficiency of the crystalline silicon solar battery can be improved.

The invention provides a glass forming mold and a glass forming method. The glass forming mold comprises a shaping mold and a pressing mold which are matched for use; the shaping mold is provided with a shaping groove, and the bottom of the shaping groove is provided with a groove bottom plane area and a groove bottom curved surface area extending outwards in the groove opening direction along the edge of the groove bottom plane area; a pressing mold is provided with a shaping convex block, the top of the shaping convex block is provided with a convex block plane area and a convex block curved surface area, the convex block plane area is matched with the groove bottom plane area, the convex block curved surface area is matched with the groove bottom curved surface area, and when the shaping mold is matched with the pressing mold for use, the shaping convex block extends into the shaping groove; and the distance d1 between the groove bottom plane area and the protruding block plane area is 90%-99% of the thickness d of the plate glass to be processed, and the distance d2 between the groove bottom curved surface area and the protruding block curved surface area is larger than d. By adopting the glass forming mold, the subsequent processing and preparation time of the curved glass prepared by the glass forming mold can be remarkably shortened.

The invention relates to the technical field of production equipment, and discloses a rough-wrought workpiece polishing device for mold production. The rough-wrought workpiece polishing device comprises a device base, wherein the top end of the device base is fixedly connected with a lifting frame, the top end of the lifting frame is movably connected with a moving frame, the middle of the movingframe is movably connected with a moving block, the bottom end of the moving block is fixedly provided with a sand disc, the top end of the moving block is fixedly provided with an air pump, an air passage is formed in the sand disc, air blowing openings are formed in the two sides of the bottom end of the sand disc, and a buffer spring is fixedly arranged in the middle of the device base. According to the rough-wrought workpiece polishing device, the air blowing openings are formed in the two sides of the sand disc and are connected with the air pump through the air passage, so that the polishing device is used for continuously blowing air to the surface of the polishing surface by utilizing the air pump when polishing work is carried out, fine sand grains or other impurities on the surface of a polishing piece are cleaned, the cleaning work when the sand disc is replaced during each polishing is replaced, the polishing process is simplified, and the polishing efficiency is improved.

The invention discloses a prism magnetorheological polishing device comprising a rotating shaft, a work bench which is installed on the rotating shaft, multiple lifting jigs which are used for clamping prisms and a magnetorheological polisher which is used for polishing prism; the top surface of the work bench is provided with an annular groove for containing magnetorheological polishing solution, wherein the annular groove, the work bench and the rotating shaft are coaxially matched; the annular groove is made of plastic material; the multiple lifting jigs are uniformly installed inside the annular groove; the magnetorheological polisher comprises a rack, a polishing tool which is matched with the lifting jigs, a lifting device which is used for driving the polishing tool to go up and down and a main shaft which is connected with the rack; the polishing tool is connected with the main shaft through the lifting device; the polishing tool is positioned in the place matched with the annular groove; the rotating shaft drives the work bench to rotate and drives the lifting jigs successively pass through under the polishing tool. By means of the above structure, the polishing efficiency is high and the polishing device is suitable for industrialization production and application. The processing cost is low, and the experience or technical ability requirements are low for detecting and precision controlling operation personnel.