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90 results about "Aluminium atom" patented technology

Diagram of aluminum atom. Aluminum is one of the heavier atoms that forms inside a red giant star after a star begins to run out of fuel. An atom of aluminum has 13 protons, 14 neutrons, and 13 electrons, so it’s a kind of metal.

Preparation method of boric acid-assisted low-temperature sintered porous aluminum foil

The invention belongs to the technical field of electrode material preparation, and particularly relates to a preparation method of boric acid-assisted low-temperature sintered porous aluminum foil. The preparation method comprises the following steps: dispersing aluminum powder, boric acid and binder raw materials in a solvent to form dispersed slurry; and coating a matrix with the dispersed slurry, drying, sintering at 450-600 DEG C under protective gas, reacting boric acid with aluminum oxide on the surface of the aluminum powder to form low-melting-point aluminoborate, reducing the sintering temperature, promoting aluminum atom diffusion, increasing sintering neck formation, and sintering to obtain the porous aluminum foil. Boron oxide generated by decomposition of boric acid is added to react with aluminum oxide to form low-melting-point aluminoborate, the sintering liquidus temperature is reduced, aluminum atom diffusion is promoted, and low-temperature sintering at 450-600 DEG C is achieved. The aluminum powder sintered foil is suitable for energy storage devices such as an aluminum electrolytic capacitor and a lithium ion battery, has the advantages of low-temperature energy conservation, high porosity and strong mechanical property, and solves the problems of aluminum oxide obstruction and high high-temperature energy consumption of the traditional aluminum powder sintered foil.
Owner:ANLU MINENG (YANGZHOU) TECHNOLOGY CO LTD

Aluminum-based quantum well laser and in-situ interface processing method thereof

The invention relates to the technical field of semiconductor electronic devices, and discloses an aluminum-based quantum well laser and an in-situ interface processing method thereof. After a low-aluminum active region with a strain compensation structure is grown and before a high-aluminum electron barrier layer is grown, the in-situ interface treatment method comprises the following steps: maintaining the temperature of a substrate at a first temperature for a first time in a V-group source atmosphere; reducing the temperature of the substrate from the first temperature to a third temperature, and introducing an aluminum source to perform strain surface pre-adsorption; introducing an aluminum source and other III-group sources except the aluminum source to grow a high-aluminum nucleating layer; and raising the temperature of the substrate from the third temperature to a fourth temperature, and growing the main body part. According to the in-situ interface processing method, the low-defect interface is obtained through the steps of strain surface relaxation, aluminum atom pre-adsorption, low-temperature nucleation and solid-state epitaxial conversion, lattice connection is achieved between the high-aluminum electron barrier layer and the low-aluminum active area with the strain compensation structure below, and the defect density of the interface is effectively reduced.
Owner:JIANGSU ETERN

Method for analyzing aluminum atom pairs in ZSM-5 molecular sieve based on super-resolution fluorescence microscopic imaging

The invention belongs to the field of molecular sieve material characterization, and particularly relates to a method for analyzing aluminum atom pairs in a ZSM-5 molecular sieve based on super-resolution fluorescence microscopic imaging, which comprises the following steps: activating a ZSM-5 molecular sieve sample; contacting the obtained sample with probe molecules; washing the ZSM-5 molecular sieve sample, and removing unbound or nonspecifically bound probe molecules; imaging the marked sample by using a super-resolution fluorescence microscope to obtain an image sequence containing a single fluorescent molecule emission event; processing the image sequence, determining a space coordinate of each fluorescence event, and reconstructing a super-resolution fluorescence image exceeding an optical diffraction limit; and based on the space coordinates of the fluorescent dots in the super-resolution fluorescence image, carrying out statistics to obtain the position, surface density or distribution information of the aluminum atom pairs in the ZSM-5 molecular sieve. According to the method disclosed by the invention, nanoscale spatial resolution, direct imaging and quantitative analysis of Al-pair in ZSM-5 (Zeolite Socony Mobil-5) can be realized.
Owner:LIAONING UNIVERSITY OF PETROLEUM AND CHEMICAL TECHNOLOGY

Method for researching corrosion resistance behavior of zinc alloy based on first principle

The invention discloses a method for researching the corrosion resistance behavior of zinc alloy based on a first principle. The method comprises the following steps: firstly, retrieving a zinc primitive cell model from a material database and carrying out structure optimization; performing crystal face cutting, cell expansion and re-structure optimization to obtain a zinc plate model; then aluminum atom random replacement doping processing is carried out, and optimization is carried out to obtain a doping model; performing static self-consistent calculation to obtain surface energy, and screening out the most stable doping model; fixing two layers of atoms at the bottom of the most stable doping model, performing chloride ion adsorption calculation and structure optimization, and calculating adsorption energy to determine a most stable adsorption site; and finally, carrying out electronic structure calculation of state density and a work function, and representing the corrosion resistance of the zinc alloy. According to the method, a zinc alloy corrosion micromechanism is deeply analyzed, theoretical guidance is provided for component optimization and corrosion resistance improvement, and compared with a traditional experimental method, the research and development cost and time are remarkably reduced, the research efficiency is improved, and the method has important theoretical and practical application value.
Owner:NINGBO UNIV

Multi-resistance-state ferroelectric memristor and preparation method thereof

The invention provides a multi-resistance-state ferroelectric memristor and a preparation method thereof.The multi-resistance-state ferroelectric memristor comprises a bottom electrode, a ferroelectric layer and a top electrode which are sequentially arranged in a stacked mode from bottom to top, the ferroelectric layer comprises at least two layers of aluminum scandium nitride thin films, and in the different layers of aluminum scandium nitride thin films, the number of the aluminum scandium nitride thin films is larger than the number of the aluminum scandium nitride thin films. The ratio of scandium atoms to aluminum atoms is gradually increased along with the number of layers from bottom to top. In each layer of aluminum scandium nitride film, the number of scandium atoms is gradually increased from bottom to top to form gradient distribution, so that the resistance of each aluminum scandium nitride film can be influenced, a plurality of stable resistance states are generated, a multi-resistance-state effect is realized, the storage state of the memristor is greatly enriched, and possibility is provided for high-density data storage.
Owner:SUZHOU LABORATORY

Method for depositing a film layer

A method of depositing a film layer on a substrate incorporates ion flux control to alter sputter atom trajectories. The method may include flowing argon around a perimeter of the substrate, wherein a surface of the substrate has a plurality of sidewalls and an edge region containing an edge structure proximate to the perimeter of the substrate; forming a plasma to ionize the argon to form a flux of Ar + ions, thereby inducing aluminum sputtering to produce aluminum atoms for deposition on the substrate; generating an AC bias on the substrate to increase the Ar + ion flux density at the edge region of the substrate, thereby changing the aluminum atom trajectory impinging the edge region; and heating the substrate to increase the mobility of the aluminum atoms deposited on the edge structure.
Owner:APPLIED MATERIALS INC

Diffusion welding method for aluminum alloy complex cavity

The invention discloses an aluminum alloy complex cavity diffusion welding method, which is characterized in that a uniform and compact organic molecule adsorption protection layer is formed on the surface of aluminum by completely immersing a cleaned blank in a diethylene glycol dimethyl ether solution for ultrasonic-assisted treatment. The protective film can effectively isolate air at normal temperature and prevent the oxidation film from regenerating; and in the initial stage of diffusion welding temperature rise, the aluminum alloy can be completely decomposed and volatilized, no impurity is left, and the high-activity clean aluminum surface is exposed. According to the method, diffusion welding is carried out under the conditions that the vacuum degree is high, the temperature is 500-560 DEG C and the pressure is 5-15 MPa in cooperation with a positioning tool system matched with the thermal expansion coefficient, aluminum atoms are fully diffused under the condition that no oxidation film hinders exist, and high-quality metallurgical bonding is formed. By means of the technical scheme, the problem that the welding rate is low due to an oxidation film on the surface of the aluminum alloy is successfully solved, meanwhile, the defects of ultrahigh vacuum equipment input and middle layer material introduction are overcome, and the manufacturing quality and production efficiency of complex aluminum alloy components are greatly improved.
Owner:CHINA STATE SHIPBUILDING CORP LTD RESEARCH INSTITUTE 719

Inorganic particle-dispersed organosol having high dispersion stability and method for producing same

PCT designated stageWO2026177193A1Inorganic particlePhysical chemistry
[Problem] To provide an organosol containing tetracoordinated aluminum atom-containing inorganic particles that have high dispersion stability in an organic solvent. [Solution] Provided are: an inorganic particle-dispersed organosol containing tetracoordinated aluminum atom-containing inorganic particles and an organic solvent, wherein the amount of aluminum atoms present in all of the inorganic particles is 100-50,000 ppm relative to the mass of the inorganic particles in terms of Al2O3, and the anion is contained in an amount of 0.1-50 ppm relative to the mass of the inorganic particle-dispersed organosol; and a method for producing the inorganic particle-dispersed organosol.
Owner:NISSAN CHEM CORP

A fe-based aluminophosphate-based co2 adsorbent and a method of making the same

The application relates to the technical field of carbon dioxide capture, in particular to a CO2 adsorbent based on Fe-based aluminophosphate and a preparation method thereof. The preparation method comprises the following steps: 1) mixing aluminum isopropoxide with water, dissolving under stirring, and then sequentially adding orthophosphoric acid and a structure directing agent to form a reaction gel; 2) adding a Fe precursor solution and additional water into the reaction gel obtained in the step 1) to form a doped system; wherein the aluminum isopropoxide is converted into Al2O3 at the mole number of aluminum atoms, and the mole ratio of the additional water to Al2O3 is 100-250:1; 3) carrying out hydrothermal reaction on the doped system obtained in the step 2) in a reaction kettle to obtain Fe-doped ALPO crystals; and 4) continuously activating the Fe-doped ALPO crystals obtained in the step 3) to obtain the CO2 adsorbent based on Fe-based aluminophosphate. The application solves the problems of the CO2 adsorbent in the prior art in the aspects of adsorption capacity, adsorption kinetics, thermal stability and chemical stability.
Owner:XEBEC ADSORPTION (SHANG HAI) CO LTD

Lithographic printing plate precursors and methods of use

A lithographic printing plate precursor has an aluminum substrate prepared using two anodization processes to provide an inner aluminum oxide layer having an average dry thickness of 300-3,000 nm and having a plurality of inner micropores having an average inner micropore diameter of <100 nm. An outer aluminum oxide layer is provided with a plurality of outer micropores having an average outer micropore diameter of 15-30 nm and a dry thickness of 30-650 nm. A hydrophilic layer is provided on the outer aluminum oxide layer having (1) a compound having an ethylenically unsaturated polymerizable group, an -OM group directly attached to a phosphorus atom, wherein M represents a hydrogen, sodium, potassium, or aluminum atom; and (2) one or more hydrophilic polymers having (a) a repeating unit comprising an amide group, and (b) a repeating unit having an -OM' group directly attached to a phosphorus atom, wherein M' represents a hydrogen, sodium, potassium, or aluminum atom. 2 An outer aluminum oxide layer is provided with a plurality of outer micropores having an average outer micropore diameter of 15-30 nm and a dry thickness of 30-650 nm. A hydrophilic layer is provided on the outer aluminum oxide layer having (1) a compound having an ethylenically unsaturated polymerizable group, an -OM group directly attached to a phosphorus atom, wherein M represents a hydrogen, sodium, potassium, or aluminum atom; and (2) one or more hydrophilic polymers having (a) a repeating unit comprising an amide group, and (b) a repeating unit having an -OM' group directly attached to a phosphorus atom, wherein M' represents a hydrogen, sodium, potassium, or aluminum atom.
Owner:EASTMAN KODAK CO

Surface-treated aluminum material, method for producing same, and member for semiconductor processing device

A surface-treated aluminum material (1) is provided with: a base material (2) comprising aluminum or an aluminum alloy; and a protective film (3) that contains an oxide of aluminum and a hydrated oxide and is formed on at least a part of the surface of the base material (2). The thickness of the protective film (3) is 2 [mu] m or more. When the mass ratio of the elements in the protective film (3) is analyzed in the depth direction by glow discharge luminescence analysis, the ratio (CH / CAL) of the integrated value (CH) of the mass ratio of hydrogen atoms to the integrated value (CAL) of the mass ratio of aluminum atoms in the range from the surface of the protective film (3) to a position at a depth of 1 [mu] m is 0.2-0.7.
Owner:UACJ CORP +1

Aluminum alloy surface functionalized passivation layer construction method based on electrochemical mechanical polishing (ECMP) and application of aluminum alloy surface functionalized passivation layer construction method in diffusion welding

The invention discloses an aluminum alloy surface functionalized passivation layer construction method based on anhydrous ECMP and application of the aluminum alloy surface functionalized passivation layer construction method in diffusion welding, and belongs to the technical field of metal material surface treatment and connection. According to the method, a non-aqueous electrolyte system with terpilenol as a matrix is adopted, and a phosphorus-doped composite passivation layer with double functions of polishing and welding is constructed on the surface of the aluminum alloy in situ through an electrochemical mechanical polishing (ECMP) process. The water-free electrolyte comprises a supporting electrolyte, a film-forming agent triethyl phosphate, a corrosion inhibitor benzotriazole, a nanometer grinding material and a viscosity modifier. The functional passivation layer can be decomposed in a controlled mode in the diffusion welding process, interface diffusion energy barriers are effectively reduced, aluminum atom mutual diffusion is promoted, and high-quality metallurgical bonding is achieved. According to the method, the technical problem that a natural oxidation film hinders atomic diffusion in aluminum alloy diffusion welding is fundamentally solved, the strength of a diffusion welding joint can reach 90% or above of that of base metal, meanwhile, the diffusion welding temperature is reduced by 20-40 DEG C, the process time is shortened by 30% or above, and the method has remarkable engineering application value.
Owner:HEBEI JINHENG ELECTRONIC TECH CO LTD

Type II hydrotreating catalyst for hydrocarbon oil and method for hydrotreating hydrocarbon oil

Hydrotreating catalyst material and / or hydrotreating catalyst particles are provided having at least two hydrotreating metal components and a chelating agent carried on a support. The support comprises an inorganic oxide binder and a post-framework modified ultra-stable Y-type (USY) zeolite in which a portion of aluminum atoms constituting a zeolite framework thereof is substituted with zirconium atoms and / or titanium atoms and / or hafnium atoms. The hydrotreating metal components form a metal complex via the chelating agent, and are carried on said support as chelating complex type II active sites.
Owner:SAUDI ARABIAN OIL CO +2

Silica particles for coating composition, and laminated substrate

The present invention addresses the problem of providing: a coating composition using silica particles in which aluminum atoms are bonded to the surfaces of the silica particles at a specific ratio in terms of Al2O3; a laminated substrate using the coating composition; and a method for producing the laminated substrate. [Solution] A silica particle to be added to a coating composition, the silica particle containing aluminum atoms in which aluminosilicate sites are formed on the silica particle, the aluminum atoms being bonded at a ratio of 120-50000 ppm / SiO2 per 1 g of SiO2 of the silica particle in terms of Al2O3, the aluminum atoms being present in the entire silica particle, and the silica particle containing aluminum atoms having aluminosilicate sites formed on the aluminosilicate sites being bonded at a ratio of 120-50000 ppm / SiO2 per 1 g of SiO2 of the silica particle in terms of Al2O3. The amount of aluminum atoms present in the entire silica particles is measured by a dissolution method by treating the silica particles with an aqueous hydrofluoric acid solution. The ratio (specific surface area (C) measured by the BET method (nitrogen adsorption method)) / (specific surface area (D) converted by a transmission electron microscope) of the silica particles is 1.00-5.00.
Owner:NISSAN CHEM CORP

Separator, electrochemical apparatus and electronic device

A separator comprises aluminum atoms and fluorine atoms, and in a 2 μm×2 μm region, a ratio A of atomic percentages of the aluminum atoms to the fluorine atoms satisfies 1≤A≤4. The separator includes a substrate, and the surface of the substrate is provided with a coating. The coating includes a plurality of spaced stripes, and an average spacing between two adjacent stripes is 1 mm to 3 mm. The separator provided in this application can improve the high-temperature cycle performance, low-temperature intermittent cycle performance, and thermal safety performance of the electrochemical apparatus.
Owner:NINGDE AMPEREX TECHNOLOGY LTD

Compound and method for producing lithium-containing film

The present invention provides a compound having a low melting point, enhanced volatility, and excellent thermal stability, and a method for producing a lithium-containing film. The compound is represented by the following formula (1).(In the formula (1), A is a nitrogen atom, a phosphorus atom, a boron atom, or an aluminum atom;E1 and E2 are independently a carbon atom, a silicon atom, a germanium atom, or a tin atom;R1 to R6 are independently a hydrogen atom or a C1-10 hydrocarbon group having a constituent atom optionally substituted with a heteroatom; however, all of R1 to R6 may not be a hydrogen atom;D is a monodentate or polydentate neutral ligand structure;x is 0 or an integer of 1 or greater, and y is an integer of 1 or greater; however, if A is a nitrogen atom and none of the carbon atoms constituting R1 to R6 is substituted with a heteroatom, x is a number of 1 or greater and y is a number of 1 or greater; andif there are more than one of A, E1, E2, and R1 to R6, these may be the same or different).
Owner:LAIR LIQUIDE SA POUR LETUDE & LEXPLOITATION DES PROCEDES GEORGES CLAUDE

Laminate and method for manufacturing laminate

The present invention provides: a laminate which is excellent in terms of adhesion after immersion in a plating solution; and a method for manufacturing the laminate. A laminate according to the present invention comprises: a base material; a metal oxide layer that contains a first metal atom which is selected from the group consisting of a titanium atom, a zirconium atom, and an aluminum atom; and a metal layer X that is disposed adjacent to the metal oxide layer and contains a second metal atom which is different from the first metal atom. The thickness of the metal oxide layer is 50-2,000 nm.
Owner:FUJIFILM CORP

Toner

A toner comprising a toner particle and an external additive, wherein the toner particle comprises a core comprising a resin A and a shell comprising a resin B on the surface of the core, the external additive comprises a hydrotalcite particle A, fluorine and aluminum are present in an inner part of the hydrotalcite particle A in line analysis in STEM-EDS mapping analysis of the toner, and a concentration ratio of the number of fluorine atoms relative to aluminum atoms (F / Al) in the hydrotalcite particle A, as determined by primary component mapping of the hydrotalcite particle A in the STEM-EDS mapping analysis of the toner, is 0.01 to 0.60.
Owner:CANON KK

A method for preparing an ultra-low temperature water-resistant and sulfur-resistant surface-all-silica Cu-SSZ-13 denitration catalyst

PendingCN122298493APtru catalystIon exchange
This invention discloses a method for preparing an ultra-low temperature, water- and sulfur-resistant surface-all-silica Cu-SSZ-13 denitrification catalyst. A silicon source, aluminum source, alkali source, template agent, organic inhibitor, crystal growth regulator, and water are mixed to form a gel. After aging and crystallization, a Na-type SSZ-13 molecular sieve is obtained. Then, copper ion exchange is performed to obtain the surface-all-silica Cu-SSZ-13 denitrification catalyst. This invention regulates the polymerization kinetics of silicon and aluminum sources on the crystal surface in the molecular sieve synthesis system, making the polymerization rate of silicon significantly lower than that of aluminum. This leads to preferential nucleation of aluminum atoms, resulting in the spontaneous formation of an eight-membered ring shell of pure silicon without aluminum during crystal growth. This inhibits the competitive adsorption and reaction of H2O and SO2 near the active center. Utilizing the advantage that the pore size of the SSZ-13 topology is smaller than the molecular dynamic diameter of SO2, SO2 is blocked from entering the interior, maintaining the integrity of the internal framework structure and ion exchange sites. This results in a catalyst exhibiting significantly better water and sulfur resistance than traditional Cu-SSZ-13 catalysts.
Owner:FUZHOU UNIV +1

Passivation method and passivation apparatus

This application provides a passivation method and passivation equipment, relating to the field of semiconductor or photovoltaic material processing, and solves the technical problems of high cost and safety hazards associated with toxic passivation consumables in substrate passivation. The passivation method includes: conveying a substrate to a first process chamber of the passivation equipment; introducing a first process gas into the first process chamber; and using a target containing aluminum to perform magnetron sputtering on the substrate to deposit a first thin film on a cross-section of the substrate, the first thin film comprising aluminum atoms; conveying the substrate to a second process chamber; introducing a second oxygen gas into the second process chamber; and using a second plasma generated by a first inductively coupled plasma ion source to oxidize the aluminum atoms in the first thin film to generate a second thin film on the surface of the first thin film, the second thin film comprising aluminum oxide. This method eliminates the need for expensive PECVD or ALD equipment, saving equipment costs, and the required consumables are non-toxic and harmless, resulting in low cost.
Owner:拉普拉斯(西安)科技有限责任公司

ZSM-5 zeolite catalyst with acid center for liquid-phase xylene isomerization and preparation method of ZSM-5 zeolite catalyst

The invention discloses a ZSM-5 zeolite catalyst with an acid center for liquid-phase xylene isomerization and a preparation method of the ZSM-5 zeolite catalyst, and belongs to the technical field of catalysts.The ZSM-5 zeolite catalyst with the acid center for liquid-phase xylene isomerization starts from increasing the surface aluminum content (active sites) of ZSM-5 zeolite, adopts a strategy of adding an aluminum source and an organic template agent step by step, and conducts dynamic control over zeolite synthesis. And the bulk phase silica-alumina ratio of the zeolite product can be reduced to 23 or below. In addition, the strategy of adding the aluminum source and the organic template agent step by step can also improve the content of aluminum atoms on the surface of the ZSM-5 molecular sieve and improve the accessibility of reactant molecules and active sites. The reaction temperature of liquid-phase xylene isomerization is low, and the molecular diffusion of reactants is limited, so that the active sites of the ZSM-5 zeolite at an acid center are increased, the contact frequency of the reactants and the ZSM-5 zeolite is increased, and the catalytic performance of the catalyst, especially the activity index of the catalyst, is improved.
Owner:TAIYUAN DACHENG ENVIRONMENTAL ENERGY CHEM TECH

Multilayer structure, method for manufacturing multilayer structure, protective sheet for electronic device, and electronic device

A multilayer structure comprising: a laminate (α) including a substrate (X) and a layer (Y), and a laminate (β) including a substrate (X) and a layer (Y'), wherein the layer (Y) contains: a reaction product (D) of a metal oxide (A) containing aluminum atoms and an inorganic phosphorus compound (B), and the layer (Y') contains at least one selected from metal oxides, metal nitrides, metal oxynitrides, metal carbonitrides, and the aforementioned reaction product (D), the laminate (α) and the laminate (β) are laminated by means of an adhesive layer (I), and the total light transmittance of the multilayer structure, as measured according to JIS K 7361-1:1997, is 87% or more, and the moisture transmittance, as measured according to ISO 15106-5, is 2.0 × 10⁻⁶. ‑3 g / m 2 Below the heavens.
Owner:KURARAY CO LTD

Purification method of quartz sand tailings

The invention discloses a purification method of quartz sand tailings, and relates to the technical field of quartz sand production. According to the method, firstly, the quartz sand tailings are pretreated, iron ore in the tailings is made to generate gaseous ferric chloride and titanium chloride by adding sodium chloride to be removed, and under the action of microwaves, cracks are generated and cracked on interfaces between minerals, so that fine impurities in the tailings are exposed, and then the acid etching effect is enhanced; the ultrasonic action can enhance the reaction of mineral substances with acid and chlorine and can further crush fine particles, then through ball milling, quartz sand is in a mineral monomer dissociation state, then through high temperature, an iron phase existing in the form of limonite in tailings is converted into a magnetic iron phase, then the iron phase is separated from a quartz phase, and the iron phase is separated from the quartz phase. The method comprises the following steps of: firstly, performing high-temperature calcination on a cross section, then roasting under reducing gas to complete enrichment of iron, and simultaneously performing high-temperature calcination to expose aluminum atoms on the cross section, and further performing accurate impurity removal on the aluminum atoms through microorganisms to obtain high-purity quartz.
Owner:JIANGSU HENGXIN SILICON-BASED MATERIALS CO LTD

AlSiC composite material and its preparation method and application

The present invention discloses an AlSiC composite material, a preparation method thereof, and an application thereof. The AlSiC composite material includes a substrate, the substrate includes a silicon carbide carrier, the silicon carbide carrier includes a silicon layer located on the surface, and aluminum in the gaps of the silicon carbide carrier, the silicon layer is provided with grooves; and carbon nanomaterials are arranged in the grooves. Since the activity of the carbon nanomaterials arranged in the grooves is greater than that of silicon atoms, the probability of binding between the carbon nanomaterials and aluminum atoms is greater than the probability of binding between carbon atoms and silicon atoms, thereby increasing the migration amount of aluminum atoms, especially on the silicon carbide surface embedded with atoms. At a certain temperature, the carbon nanomaterials embedded in the grooves disperse the density of aluminum to a certain extent and increase the aggregation of atoms near the center line of symmetry of the droplet, thereby further improving the wettability during the preparation of the composite material.
Owner:HUBEI UNIV OF ARTS & SCI

Multilayer structure and method for manufacturing the same, packaging material using the same, vacuum adiabatic body, and protective sheet for electronic device

The present invention provides a novel multilayer structure which is excellent in gas barrier properties and water vapor barrier properties, can maintain the gas barrier properties and water vapor barrier properties even after being bent, and does not cause appearance defects such as interlayer peeling after retort treatment, a packaging material and an article using the same. The present invention relates to a multilayer structure which has a substrate (X), a layer (Y), and a layer (Z), at least one set of the layer (Y) and the layer (Z) are adjacent and stacked, the layer (Y) contains a reaction product (D) of a metal oxide (A) and an inorganic phosphorus compound (BI), the metal oxide (A) contains aluminum atoms, the layer (Z) contains a metal compound (R) having metal atoms (M R ) and a hydroxyl group-containing resin (W), and the molar ratio M R / M MR of the number of moles (M Al ) of the metal atoms (M MR ) per unit area of the layer (Y) and the layer (Z) to the number of moles (M Al ) of aluminum atoms is 0.0005 or more and 0.05 or less.
Owner:KURARAY CO LTD

A method for ammonia-free preparation of two-dimensional molybdenum nitride and crystalline Mo2N nanosheets

ActiveCN117699745BNitrogen-metal/silicon/boron binary compoundsHexagonal crystal systemEtching
The present application relates to the technical field of nano energy storage material preparation, and particularly relates to a two-dimensional molybdenum nitride and crystalline Mo2N nanosheet ammonia-free preparation method. A two-dimensional molybdenum boride compound derived from a rare earth molybdenum aluminum boride compound is used as a precursor to prepare two-dimensional molybdenum nitride and crystalline Mo2N nanosheet with a six-fold symmetric layered structure under an ammonia-free condition. A compound with a hexagonal crystal system formed by metal molybdenum, heavy rare earth metal, metal aluminum and boron is used as a precursor. After wet etching of an aluminum atom layer and a rare earth atom in the compound by using a fluorine-containing acid solution, intercalation and exfoliation are performed to form a two-dimensional derivative with a certain energy storage density. The two-dimensional derivative is annealed at different temperatures under nitrogen to control the atomic layer spacing, surface chemical state, surface functional group and chemical bond in the two-dimensional derivative, realize in-situ conversion from the two-dimensional molybdenum boride to the two-dimensional molybdenum nitride and crystalline Mo2N with a six-fold symmetric layered structure, and significantly improve the specific capacitance.
Owner:NORTHEASTERN UNIV CHINA

Deformable high-strength aluminum alloy compositions and methods of making the same

PendingUS20260152827A1CobaltMetal
An alloy comprising 92 at % aluminum, 2 at % titanium, 2 at % iron, 2 at % cobalt, and 2 at % nickel. A method of making an alloy is disclosed. The method contains the steps of providing particles of desired composition, utilizing a selective leaser melting (SLM) apparatus producing a first layer of the particles on a substrate and melting and solidifying a first group selected areas of the layer of particles, wherein the melting and the solidification results in an alloy of desired composition, containing intermetallic lamellae and has thickness equal to thickness of the first layer. The process is repeated to produce an object of specified thickness and shape containing the melted and solidified areas.
Owner:PURDUE RES FOUND

Diamond particle aluminum-based composite material and preparation method thereof

The embodiment of the invention provides a diamond particle aluminum-based composite material and a preparation method thereof, and the preparation method is characterized by comprising the following steps: (X1) carrying out wet ball milling, dispersion and drying on aluminum powder and diamond particles with preset volume fractions to obtain diamond particle aluminum-based composite powder; and (X2) the diamond particle aluminum-based composite powder obtained in the step (X1) is subjected to vacuum hot pressing sintering, gradient heating is conducted in the vacuum hot pressing sintering process, pressure is applied to the diamond particle aluminum-based composite powder in the gradient heating process, and the diamond particle aluminum-based composite material is obtained. According to the embodiment of the invention, a brittle Al3C4 phase generated by mutual diffusion reaction of carbon atoms and aluminum atoms due to high temperature can be reduced, so that the problems of increased interface thermal resistance and relatively low density of the composite material caused by the brittle Al3C4 phase are reduced; material deformation and stress concentration can be reduced; therefore, the diamond particle aluminum-based composite material with good interface bonding, high density and good thermal physical performance can be obtained.
Owner:HUNAN UNIV OF TECH

Simulation method for preparing aluminum-tin-copper film through magnetron sputtering and related device

PendingCN121999933AAccurate prediction of sputtering energy distributionAccurately predict anglesChemical property predictionMolecular entity identificationCopper atomProcess simulation
The invention discloses a simulation method for preparing an aluminum-tin-copper film through magnetron sputtering and a related device, and relates to the technical field of analogue simulation, the method comprises the following steps: simulating a process of bombarding an aluminum-tin-copper alloy target material by argon ions according to a preset energy range of the argon ions to obtain sputtering atom data; based on the sputtering atom data, simulating the process of moving aluminum atoms, tin atoms and copper atoms from a target surface to a matrix by utilizing a constructed target three-dimensional model of magnetron sputtering equipment to obtain data of the atoms reaching the matrix; preprocessing the copper substrate in the constructed simulation box to obtain a target molecular dynamics simulation system; and determining deposition parameters according to the atom arrival matrix data, and performing aluminum-tin-copper film deposition process simulation and relaxation treatment on the target molecular dynamics simulation system based on the deposition parameters to obtain a microstructure model of the aluminum-tin-copper film. The simulation method is provided for process development and optimization of magnetron sputtering preparation of the high-performance aluminum-tin-copper thin film.
Owner:YANTAI ADVANCED MATERIALS & GREEN MFG SHANDONG PROVINCIAL LAB +1

Large-grain β molecular sieve and preparation method thereof

The present invention relates to the field of catalytic material synthesis, and discloses a large-grain beta molecular sieve and a preparation method thereof. The large-grain beta molecular sieve adopts a composite silicon-aluminum source with a specific structure, especially acid-treated and calcined silicon-aluminum gel, in which silicon atoms exist in a Q4 coordination form and aluminum atoms exist in a four-coordinate aluminum form. The above-mentioned silicon-aluminum source, an inorganic base, a template agent, and water are used as raw materials, and crystallization is performed to obtain a large-grain beta molecular sieve. The preparation method does not require the addition of a fluorine-containing mineralizer, does not additionally add other organic substances except the template agent, and the raw material preparation process is simple and fast. The beta molecular sieve synthesized by the present invention has high crystallinity, an adjustable silicon-aluminum ratio, a regular morphology, a uniform grain size, and a grain size preferably of 700-900nm.
Owner:CHINA PETROLEUM & CHEMICAL CORP +1