The invention discloses a device and a
system for compensating the
direct current self-bias
voltage of an electrostatic chuck, and relates to the technical field of
semiconductor processing, the device comprises a
radio frequency impedance matcher, a numerical value conversion unit and an analog-to-
digital conversion circuit, the
radio frequency impedance matcher is used for providing intermediate parameters related to
process conditions, and the numerical value conversion unit is used for converting the numerical value into the analog-to-
digital conversion circuit; the method has the advantages that the problem that the
potential difference between the
electrode and the
wafer is increased due to the direct-current self-bias can be compensated through a series of operations such as acquiring the intermediate parameters, calculating the direct-current self-bias approximate value and feeding back and compensating the
voltage, so that the condition that the
wafer adsorption effect of the electrostatic chuck is poor is improved, and the service life of the electrostatic chuck is prolonged. According to different
process conditions such as
radio frequency power, gas types, gas flow,
cavity pressure and the like, intermediate parameters are accurately obtained, an approximate value of the direct-current self-bias
voltage is calculated through a function relation, then accurate compensation of the direct-current self-bias voltage is achieved, and the accuracy of the direct-current self-bias voltage is improved. And the performance and the efficiency of
semiconductor processing equipment are improved.