The invention provides a top grid self-alignment thin-film transistor with source/drain areas raised and a manufacturing method of the top grid self-alignment thin-film transistor with the source/drain areas raised. The manufacturing method includes the steps that an oxide semiconductor active layer, a grid dielectric layer and a grid electrode are sequentially formed on glass or a flexible substrate, and the thickness of the oxide semiconductor active layer is 5-20 nanometers in order to reduce influences of short-wavelength light on off-state characteristics of the thin-film transistor; then grid dielectric is corroded with the grid electrode as a stopping layer, the active layer corresponding to the grid dielectric is made to serve as a channel region, the active layers on the two sides are a source area and a drain area respectively, and self-alignment is achieved; next, low-resistivity conductive thin films are deposited, and the raised source area and the raised drain area are formed after photoetching, stripping or corrosion. The thin channels are adopted and the source area and the drain area are raised, not only are the influences of the light on the channels reduced, but also the resistance of the source area and the resistance of the drain area are reduced, and performance of the thin-film transistor is improved.