6results about How to "Efficient etching" patented technology

This invention provides a method for fabricating a stepped metal structure and a silicon photonic device, comprising: 1) forming a stepped structure on a substrate; 2) depositing an isolation dielectric layer on the stepped structure; 3) depositing a metal layer, wherein the thickness of the top surface metal is greater than the thickness of the sidewall metal; 4) forming a pattern barrier layer on the metal layer; 5) dry etching the exposed second portion of the top surface metal, such that the thickness of the second portion of the top surface metal is approximately equal to that of the second portion of the sidewall metal; 6) removing the exposed second portion of the top surface metal and the second portion of the sidewall metal using an isotropic etching process. This invention combines dry metal etching and isotropic etching techniques. By further adjusting the etching thickness ratio of dry metal etching and isotropic etching, the lateral corrosion of the metal layer at the cross-sectional position of the top surface of the stepped structure can be reduced, and the lateral corrosion size of the metal layer can be more controllable.

The present invention discloses a dry etching process for an N-polar III-V semiconductor material, and relates to the technical field of semiconductor materials. The dry etching process of the present invention comprises: performing ICP etching on an N-polar III-V semiconductor material, wherein the working gas comprises boron trichloride, chlorine, argon and an etching gas containing fluorine ions. The present invention selects the type of working gas so that the surface of the etched semiconductor material is smoother and has fewer impurities.

The present invention provides an environmentally friendly and efficient method for etching diamond particles, and relates to the field of diamond etching technology. The method for etching diamond particles is to use water as a solvent to perform a preliminary etching treatment on the diamond particles through an ozone combined with an ultrasonic process, and then perform a rapid heat treatment to fully etch. The present invention overcomes the shortcomings of the existing vapor phase diamond etching technology, significantly improves the surface etching effect of air on diamond particles, and the technology does not produce waste liquid and other pollutants, which is relatively environmentally friendly. The preparation process is fast and efficient, and the etching can be effectively regulated by adjusting parameters such as ozone treatment and temperature, significantly improving the etching effect and efficiency.

The application provides a three-dimensional laser etching method based on tire cylindrical coordinates, which establishes a plane design polar coordinate based on the shape characteristics of the tire in the design, gives a reference point coordinate and an etching coordinate polar radius and polar angle, obtains a polar radius deviation value and a polar angle deviation value through operation to determine the relative plane position of the etching point to the reference point; the polar coordinate is established on the tire conveying surface, the polar point is the center of the tire; the polar axis is established in the opposite direction by connecting the polar point and the projection point of the base coordinate origin of the robot in the polar coordinate; the Z axis passes through the polar point, is perpendicular to the polar coordinate plane and faces upward to establish a three-dimensional cylindrical coordinate; based on the three-dimensional coordinate, the robot performs 3D camera scanning and modeling; through calculation of the running coordinate of the sixth axis and the coordinate conversion with the base coordinate of the robot, after the sixth axis center of the robot runs to the second center, the sixth axis is rotated by an angle to perform laser etching.

The invention provides a laser direct writing method suitable for a two-dimensional code in frosted surface microcrystalline glass, and the method specifically comprises the following steps: receiving two-dimensional code information to be processed, and compiling the two-dimensional code information into a corresponding space coding pattern; starting a beam shaping unit, dynamically adjusting multi-beam distribution and energy parameters of a laser beam according to the geometric distribution condition of a space coding pattern, and enabling a modified trace formed by a laser focus array in the microcrystalline glass to be matched with a design pattern of the two-dimensional code; when a glass ceramic sample is completely immersed in the matching liquid, after full-surface uniform coverage is realized by virtue of physical characteristics of the liquid, a light beam focusing unit is started, and a shaped laser beam is focused to a specified depth position in the glass ceramic for multi-light-beam parallel processing; therefore, a high-quality two-dimensional code which accords with coding characteristics and is clear in edge is etched in the frosted surface microcrystalline glass.

The invention discloses an efficient etching method and device based on microwave ECR and radio frequency plasma coupling, and relates to the technical field of plasma etching.The device comprises a cylindrical metal waveguide tube, and the interior of the cylindrical metal waveguide tube is divided into an upper cavity on the upper portion and an etching area on the lower portion; a plurality of rectangular waveguide tubes communicated with the interior of the cylindrical metal waveguide tube are uniformly distributed on the outer wall of the cylindrical metal waveguide tube corresponding to the upper cavity, and the tail end of each rectangular waveguide tube is provided with a microwave input port communicated with a microwave source; a quartz cavity communicated with the airflow inlet and a coil wound on the outer wall of the quartz cavity are arranged in the upper cavity, the two ends of the coil are connected with a direct-current power supply and / or a radio-frequency power supply through wires, and a plasma discharge area is arranged in the quartz cavity. The electron cyclotron resonance technology and the radio frequency plasma inductive coupling technology are used for jointly regulating and controlling the microwave plasma, the energy conversion efficiency from microwaves to the plasma is improved, more uniform plasma can be generated, the etching area is remarkably increased, and efficient etching is achieved.