The invention relates to an NPN-structure-based
laser photovoltaic
cell and a preparation process thereof. The photovoltaic
cell comprises an N type GaAs conducting layer, a tunneling junction and a GaAs
cell which are sequentially grown on a semi-insulating GaAs substrate, wherein the GaAs cell comprises a P / N junction and an N type window layer which are sequentially distributed in the direction gradually far away from the substrate. The preparation process comprises the following steps of: sequentially growing the N type conducting layer, the tunneling junction, the P / N junction, the N type window layer and an N type
contact layer on the semi-insulating substrate by an epitaxial growing method to form a photovoltaic cell base body; and
processing on the photovoltaic cell base body to form an isolating groove, a positive
electrode, a negative
electrode, an antireflection layer and an
electrode lead to form the target product. The photovoltaic cell is low in series resistance, high in output
voltage and high in light absorption and
light conversion efficiency, can widely serve as a high-efficiency
laser photovoltaic cell and is easy and convenient to prepare. The
processing time of a device can be effectively saved; the cost is reduced; and the requirement of
mass production is met.