The invention discloses a method for preparing negative photosensitive polyimide which is based on 2, 2-bis<4-(2, 4-diaminophenoxy) phenyl> hexafluoropropane. The method takes the 2,2-bis<4-(2,4-diaminophenoxy)phenyl> hexafluoropropane and dihydric acid anhydride as raw materials for carrying out the polymerization reaction, hyper-branched fluoride-containing polyamic acid which takes the macromolecular chain end group as the anhydride group is obtained, the hyper-branched fluoride-containing polyamic acid is further reacted with p-hydroxyaniline or m-hydroxyaniline, hyper-branched fluoride-containing polyimide which takes phenolic hydroxyl as the end group by chemical imidization reaction is obtained, phenolic hydroxyl end-blocked fluoride-containing hyper-branched polyimide powder is obtained by precipitation, washing and vacuum drying process, and the hyper-branched fluoride-containing polyimide photosensitive material with the negative photosensitive performance is obtained by undergoing the functionalization after the dissolution. The material has high photosensitive performance, high resolution and excellent process, and the cured product has low water absorption, excellent heat resistance, dielectric performance and mechanical performance, thus having great application prospect in the field of electronic micro-electronics.